Mercaptopropionic Acid

Mercaptopropionic Acid

SCHEMBL9182736

C=C(C)C(=O)OCC.O=C(O)CCS

nearest known ligand 0.47

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.47
TSHR P16473 4/20 0.42
ALDH1A1 P00352 6/20 0.40
EGLN1 Q9GZT9 1/20 0.39
MAPT P10636 2/20 0.38
ACE P12821 1/20 0.38
GLO1 Q04760 1/20 0.37
CYP2D6 P10635 2/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
LMNA P02545 1/20 0.37
HSD17B10 Q99714 1/20 0.37
MGAM O43451 1/20 0.35
GAA P10253 1/20 0.35
SI P14410 1/20 0.35
MGAM2 Q2M2H8 1/20 0.35
FOLH1 Q04609 1/20 0.34
CYP2C19 P33261 1/20 0.34
FFAR3 O14843 1/20 0.33
HDAC3 O15379 1/20 0.33
HDAC1 Q13547 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Succinic Acid SCHEMBL721623 0.88 THRB (0.53) THRBTSHRALDH1A1EGLN1MAPT
Succinic Acid SCHEMBL3871268 0.88 THRB (0.53) THRBTSHRALDH1A1EGLN1MAPT
Glutarate SCHEMBL3866346 0.85 THRB (0.50) THRBTSHRALDH1A1EGLN1HSD17B10
Adipic Acid SCHEMBL3877653 0.85 THRB (0.50) THRBTSHRALDH1A1LMNAHSD17B10
SCHEMBL7090019 0.83 THRB (0.58) THRBTSHRALDH1A1EGLN1MAPT
Bicarbonate SCHEMBL10996730 0.82 THRB (0.59) THRBTSHRALDH1A1EGLN1MAPT
SCHEMBL27834847 0.82 THRB (0.59) THRBTSHRALDH1A1EGLN1MAPT
Acetic Acid SCHEMBL28298395 0.82 THRB (0.59) THRBTSHRALDH1A1EGLN1MAPT
SCHEMBL19409375 0.82 THRB (0.64) THRBTSHRALDH1A1EGLN1MAPT
SCHEMBL15030 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0432727-B1 Electrophotographic light-sensitive material FUJI PHOTO FILM CO LTD (JP) 1995-07-05 EP disclosed
US-5227272-A Layer containing inorganic photoconductor and binder resin with block copolymer composed of acidic component and hydrocarbyl methacrylate component FUJI PHOTO FILM CO., LTD. (JP) 1993-07-13 US disclosed
EP-0432727-A2 Electrophotographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1991-06-19 EP disclosed