SCHEMBL919012

SCHEMBL919012

[CH2]COCCC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 7/20 0.51
KMT2A Q03164 7/20 0.51
ALDH1A1 P00352 4/20 0.51
CA12 O43570 1/20 0.47
CA1 P00915 1/20 0.47
CA2 P00918 1/20 0.47
CA9 Q16790 1/20 0.47
GRIN2D O15399 4/20 0.46
GRIN3B O60391 4/20 0.46
GRIN1 Q05586 4/20 0.46
GRIN2A Q12879 4/20 0.46
GRIN2B Q13224 4/20 0.46
GRIN2C Q14957 4/20 0.46
GRIN3A Q8TCU5 4/20 0.46
LMNA P02545 3/20 0.44
RAB9A P51151 1/20 0.40
MAPT P10636 1/20 0.40
ATM Q13315 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
MAPK1 P28482 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13998865 0.78 MEN1 (0.51) MEN1KMT2AALDH1A1CA12CA1
SCHEMBL5917723 0.78 MEN1 (0.51) MEN1KMT2AALDH1A1CA12CA1
SCHEMBL919840 0.77 CA12 (0.44) MEN1KMT2AALDH1A1CA12CA1
SCHEMBL10735027 0.77 GRIN2D (0.61) MEN1KMT2AALDH1A1CA12CA1
SCHEMBL17457693 0.75 GRIN2D (0.59) MEN1KMT2AALDH1A1CA12CA1
SCHEMBL16682527 0.75 LMNA (0.56) MEN1KMT2AALDH1A1CA12CA1
SCHEMBL15532294 0.75 GRIN2D (0.59) MEN1KMT2AALDH1A1CA12CA1
SCHEMBL15532315 0.75 MEN1 (0.53) MEN1KMT2AALDH1A1CA12CA1
SCHEMBL2757 0.74 GRIN2D (0.56) MEN1KMT2AALDH1A1CA12CA1
SCHEMBL25222688 0.73 GRIN2D (0.56) MEN1KMT2AALDH1A1CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7871755-B2 Photosensitive composition KABUSHIKI KAISHA TOSHIBA (JP) 2011-01-18 US disclosed
US-20090081582-A1 irradiating a predetermined region of photosensitive layer, subjecting the photosensitive layer after baking to development treatment with an alkali aqueous solution to selectively remove the light-exposed part; has a photo-acid generator which generates an acid by the action of actinic radiation KABUSHIKI KAISHA TOSHIBA 2009-03-26 US disclosed