SCHEMBL919840

SCHEMBL919840

[CH2]COCC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.44
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
CA9 Q16790 1/20 0.44
GRIN2D O15399 4/20 0.42
GRIN3B O60391 4/20 0.42
GRIN1 Q05586 4/20 0.42
GRIN2A Q12879 4/20 0.42
GRIN2B Q13224 4/20 0.42
GRIN2C Q14957 4/20 0.42
GRIN3A Q8TCU5 4/20 0.42
GBA1 P04062 4/20 0.40
GBA2 Q9HCG7 9/20 0.39
ALDH1A1 P00352 1/20 0.39
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
UGCG Q16739 3/20 0.35
MGAM O43451 1/20 0.35
LCT P09848 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5095244 0.85 GRIN2D (0.50) CA12CA1CA2CA9GRIN2D
SCHEMBL3913351 0.78 CA12 (0.45) CA12CA1CA2CA9GRIN2D
SCHEMBL855034 0.78 CA12 (0.45) CA12CA1CA2CA9GRIN2D
SCHEMBL919012 0.77 MEN1 (0.51) CA12CA1CA2CA9GRIN2D
SCHEMBL92293 0.76 ALDH1A1 (0.47) CA12CA1CA2CA9GRIN2D
SCHEMBL197069 0.75 CA12 (0.47) CA12CA1CA2CA9GRIN2D
SCHEMBL25812571 0.73 MEN1 (0.46) CA12CA1CA2CA9GRIN2D
SCHEMBL12511153 0.73 GBA2 (0.44) CA12CA1CA2CA9GRIN2D
SCHEMBL13094610 0.73 CA12 (0.41) CA12CA1CA2CA9GRIN2D
SCHEMBL4806332 0.73 CA12 (0.38) CA12CA1CA2CA9GRIN2D

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7871755-B2 Photosensitive composition KABUSHIKI KAISHA TOSHIBA (JP) 2011-01-18 US disclosed
US-20090081582-A1 irradiating a predetermined region of photosensitive layer, subjecting the photosensitive layer after baking to development treatment with an alkali aqueous solution to selectively remove the light-exposed part; has a photo-acid generator which generates an acid by the action of actinic radiation KABUSHIKI KAISHA TOSHIBA 2009-03-26 US disclosed