⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4189741 | 0.89 | — | — | |
| SCHEMBL6889948 | 0.89 | — | — | |
| SCHEMBL15213 | 0.87 | — | — | |
| SCHEMBL6890331 | 0.82 | — | — | |
| SCHEMBL2289440 | 0.82 | — | — | |
| Ammonia Solution, Strong SCHEMBL25368540 | 0.75 | — | — | |
| SCHEMBL2058334 | 0.75 | — | — | |
| SCHEMBL4812214 | 0.75 | — | — | |
| SCHEMBL19513938 | 0.75 | — | — | |
| SCHEMBL20768711 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 184 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111033718-B | Apparatus and method for thin film resistor using via blocking layer | 德克萨斯仪器股份有限公司 | 2023-10-13 | — | — | CN | claimed |
| WO-2022237295-A1 | PHASE SHIFT MASK AND MANUFACTURING METHOD THEREFOR | 上海传芯半导体有限公司 | 2022-11-17 | — | — | WO | claimed |
| CN-115343910-A | Phase-shifting mask and manufacturing method thereof | 上海传芯半导体有限公司 | 2022-11-15 | — | — | CN | claimed |
| CN-115202146-A | Phase-shifting mask and manufacturing method thereof | 上海传芯半导体有限公司 | 2022-10-18 | — | — | CN | claimed |
| CN-114839834-A | Mask base plate for projection type photoetching, photomask and preparation method thereof | 上海传芯半导体有限公司 | 2022-08-02 | — | — | CN | claimed |
| CN-112941462-B | Composite coating cutter and preparation method and application thereof | 东莞市华升真空镀膜科技有限公司 | 2022-03-22 | — | — | CN | claimed |
| US-20210322991-A1 | RAPID THERMAL CYCLING | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2021-10-21 | — | — | US | claimed |
| CN-112941462-A | Composite coating cutter and preparation method and application thereof | 东莞市华升真空镀膜科技有限公司 | 2021-06-11 | — | — | CN | claimed |
| WO-2020122925-A1 | RAPID THERMAL CYCLING | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2020-06-18 | — | — | WO | claimed |
| EP-3652779-A1 | DEVICE AND METHOD FOR A THIN FILM RESISTOR USING A VIA RETARDATION LAYER | Texas Instruments Incorporated (US) | 2020-05-20 | — | — | EP | claimed |
| US-20030214230-A1 | Dark layer for an electroluminescent device | LUX OPERATING LIMITED PARTNERSHIP (CA) | 2003-11-20 | — | — | US | claimed |
| WO-2003094253-A2 | DARK LAYER FOR AN ELECTROLUMINESCENT DEVICE | LUXELL TECHNOLOGIES INC. (CA) | 2003-11-13 | — | — | WO | claimed |
| WO-2003094255-A2 | CONTRAST ENHANCED OLEDS | LUXELL TECHNOLOGIES INC. (CA) | 2003-11-13 | — | — | WO | claimed |
| WO-2003049210-A1 | MATRIX DISPLAY WITH OPTICAL INTERFERENCE MEMBER | LUXELL TECHNOLOGIES INC. (CA) | 2003-06-12 | — | — | WO | claimed |
| US-5494845-A | Method of fabrication of bilayer thin film resistor | RAYTHEON COMPANY (US) | 1996-02-27 | — | — | US | claimed |
| US-5468672-A | Thin film resistor and method of fabrication | RAYTHEON COMPANY (US) | 1995-11-21 | — | — | US | claimed |
| EP-0548652-A1 | Method of fabricating resistive conductive patterns on aluminum nitride substrates | MOTOROLA, INC. (US) | 1993-06-30 | — | — | EP | claimed |
| US-5221639-A | Chromium containing film, then refractory metal layer; patterning | MOTOROLA, INC. (US) | 1993-06-22 | — | — | US | claimed |
| US-4699871-A | Methods for developing high speed chip carriers with impedance matching packaging | GENERAL MICROELECTRONICS CORP. (US) | 1987-10-13 | — | — | US | claimed |
| US-4038517-A | ENVIRONMENTALLY AND WEAR PROTECTED GLASS SUBSTRATE THIN FILM THERMAL PRINTHEADS | ROCKWELL INTERNATIONAL CORPORATION (US) | 1977-07-26 | — | — | US | claimed |