SCHEMBL920654

SCHEMBL920654

[Al+3].[Cr+3].[O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18290845 0.89
SCHEMBL30105871 0.87
SCHEMBL30194772 0.87
SCHEMBL29378154 0.87
SCHEMBL904465 0.87
SCHEMBL137606 0.87
SCHEMBL1329036 0.87
SCHEMBL19327581 0.87
Water SCHEMBL10792675 0.75
SCHEMBL566932 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8586130-B2 Increasing exposure tool alignment signal strength for a ferroelectric capacitor layer TEXAS INSTRUMENTS INCORPORATED (US) 2013-11-19 US claimed
US-20110014360-A1 Increasing Exposure Tool Alignment Signal Strength for a Ferroelectric Capacitor Layer TEXAS INSTRUMENTS INCORPORATED (US) 2011-01-20 US claimed
US-20090243123-A1 Increasing Exposure Tool Alignment Signal Strength for a Ferroelectric Capacitor Layer TEXAS INSTRUMENTS INCORPORATED (US) 2009-10-01 US claimed
US-8586130-B2 Increasing exposure tool alignment signal strength for a ferroelectric capacitor layer TEXAS INSTRUMENTS INCORPORATED (US) 2013-11-19 US disclosed
US-8466569-B2 Increasing exposure tool alignment signal strength for a ferroelectric capacitor layer TEXAS INSTRUMENTS INCORPORATED (US) 2013-06-18 US disclosed
US-8324742-B2 Alignment mark for opaque layer TEXAS INSTRUMENTS INCORPORATED (US) 2012-12-04 US disclosed
US-8268696-B2 Alignment mark for opaque layer TEXAS INSTRUMENTS INCORPORATED (US) 2012-09-18 US disclosed
US-20110014360-A1 Increasing Exposure Tool Alignment Signal Strength for a Ferroelectric Capacitor Layer TEXAS INSTRUMENTS INCORPORATED (US) 2011-01-20 US disclosed
US-20090243123-A1 Increasing Exposure Tool Alignment Signal Strength for a Ferroelectric Capacitor Layer TEXAS INSTRUMENTS INCORPORATED (US) 2009-10-01 US disclosed
US-20090243122-A1 ALIGNMENT MARK FOR OPAQUE LAYER TEXAS INSTRUMENTS INCORPORATED (US) 2009-10-01 US disclosed
EP-1135336-B1 MATERIALS FOR SOLID-STATE GAS SENSORS CITY TECH (GB) 2003-04-23 EP disclosed
US-5742117-A Metallized high voltage spacers CANDESCENT TECHNOLOGIES CORPORATION 1998-04-21 US disclosed
US-5649847-A Backplate of field emission device with self aligned focus structure and spacer wall locators CANDESCENT TECHNOLOGIES, INC. (US) 1997-07-22 US disclosed
US-5650690-A Backplate of field emission device with self aligned focus structure and spacer wall locators CANDESCENT TECHNOLOGIES, INC. (US) 1997-07-22 US disclosed
WO-1997019460-A1 FLAT PANEL DISPLAY WITH REDUCED ELECTRON SCATTERING EFFECTS CANDESCENT TECHNOLOGIES CORPORATION (US) 1997-05-29 WO disclosed
US-5578899-A Field emission device with internal structure for aligning phosphor pixels with corresponding field emitters SILICON VIDEO CORPORATION (US) 1996-11-26 US disclosed
EP-0740846-A1 FIELD EMISSION DEVICE WITH INTERNAL STRUCTURE FOR ALIGNING PHOSPHOR PIXELS WITH CORRESPONDING FIELD EMITTERS Candescent Technologies Corporation (US) 1996-11-06 EP disclosed
US-5543683-A Faceplate for field emission display including wall gripper structures SILICON VIDEO CORPORATION (US) 1996-08-06 US disclosed
US-5532548-A Field forming electrodes on high voltage spacers SILICON VIDEO CORPORATION (US) 1996-07-02 US disclosed
WO-1996016429-A2 FIELD EMISSION DEVICE WITH INTERNAL STRUCTURE FOR ALIGNING PHOSPHOR PIXELS WITH CORRESPONDING FIELD EMITTERS CANDESCENT TECHNOLOGIES CORPORATION (US) 1996-05-30 WO disclosed