SCHEMBL92080

SCHEMBL92080

C/C(=N\OC(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.78

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.78
CDK5 Q00535 2/20 0.78
CDK5R1 Q15078 2/20 0.78
PKM P14618 2/20 0.78
SMN1; SMN2 Q16637 4/20 0.61
RBBP9 O75884 1/20 0.60
CYP1A2 P05177 2/20 0.60
XDH P47989 2/20 0.57
MAPK1 P28482 2/20 0.55
L3MBTL1 Q9Y468 2/20 0.55
LMNA P02545 1/20 0.55
HTT P42858 1/20 0.55
RAB9A P51151 6/20 0.54
NPC1 O15118 5/20 0.54
CASP3 P42574 2/20 0.54
SENP8 Q96LD8 2/20 0.54
SENP7 Q9BQF6 2/20 0.54
SENP6 Q9GZR1 2/20 0.54
TDP1 Q9NUW8 1/20 0.54
TNF P01375 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1357956 1.00 MAPT (0.78) MAPTCDK5CDK5R1PKMSMN1; SMN2
SCHEMBL10903675 0.91 CYP1A2 (0.74) MAPTCDK5CDK5R1PKMSMN1; SMN2
SCHEMBL12328541 0.88 CDK5 (1.00) MAPTCDK5CDK5R1PKMSMN1; SMN2
SCHEMBL10779103 0.86 SMN1; SMN2 (0.62) MAPTCDK5CDK5R1PKMSMN1; SMN2
SCHEMBL92008 0.86 SMN1; SMN2 (0.79) MAPTCDK5CDK5R1PKMSMN1; SMN2
SCHEMBL12328529 0.86 SMN1; SMN2 (0.62) MAPTCDK5CDK5R1PKMSMN1; SMN2
SCHEMBL212911 0.86 MAPT (0.60) MAPTCDK5CDK5R1PKMSMN1; SMN2
SCHEMBL11963959 0.86 MAPT (0.60) MAPTCDK5CDK5R1PKMSMN1; SMN2
SCHEMBL14667470 0.86 MAPT (0.60) MAPTCDK5CDK5R1PKMSMN1; SMN2
SCHEMBL10905691 0.84 MAPT (0.67) MAPTCDK5CDK5R1PKMSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 343 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4326707-A1 DIELECTRIC MATERIALS BASED ON OLIGOAMIDE-EXTENDED BISMALEIMIDES Merck Patent GmbH (DE) 2024-02-28 EP disclosed
EP-4301804-A1 DIELECTRIC MATERIALS BASED ON AMIDE-IMIDE-EXTENDED BISMALEIMIDES Merck Patent GmbH (DE) 2024-01-10 EP disclosed
WO-2023243593-A1 RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED FILM, SUBSTRATE WITH MULTILAYER FILM, METHOD FOR MANUFACTURING SUBSTRATE WITH PATTERN, METHOD FOR MANUFACTURING PATTERNED CURED FILM, AND METHOD FOR MANUFACTURING RESIN COMPOSITION セントラル硝子株式会社 2023-12-21 WO disclosed
EP-4255963-A1 DIELECTRIC MATERIALS BASED ON BISMALEIMIDES CONTAINING CARDO/SPIRO MOIETIES Merck Patent GmbH (DE) 2023-10-11 EP disclosed
WO-2023099425-A1 DIELECTRIC MATERIALS BASED ON HETEROAROMATIC-EXTENDED BISMALEIMIDES MERCK PATENT GMBH (DE) 2023-06-08 WO disclosed
WO-2023074171-A1 RELEASE LAYER-FORMING COMPOSITION, LAMINATE, AND METHOD FOR MANUFACTURING LAMINATE 日産化学株式会社 2023-05-04 WO disclosed
WO-2022223599-A1 DIELECTRIC MATERIALS BASED ON OLIGOAMIDE-EXTENDED BISMALEIMIDES MERCK PATENT GMBH (DE) 2022-10-27 WO disclosed
WO-2022184661-A1 DIELECTRIC MATERIALS BASED ON AMIDE-IMIDE-EXTENDED BISMALEIMIDES MERCK PATENT GMBH (DE) 2022-09-09 WO disclosed
WO-2022131277-A1 RESIN COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM, SUBSTRATE HAVING MULTILAYER FILM, METHOD FOR MANUFACTURING PATTERNED SUBSTRATE, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERN CURED FILM, METHOD FOR MANUFACTURING POLYMER, AND METHOD FOR MANUFACTURING RESIN COMPOSITION セントラル硝子株式会社 2022-06-23 WO disclosed
WO-2022117715-A1 DIELECTRIC MATERIALS BASED ON BISMALEIMIDES CONTAINING CARDO/SPIRO MOIETIES MERCK PATENT GMBH (DE) 2022-06-09 WO disclosed
US-7183038-B2 Lithographic printing plate precursor and lithographic printing method FUJI PHOTO FILM CO., LTD. (JP) 2007-02-27 US disclosed
US-20070039500-A1 Manufacturing method of lithographic printing plate and manufacturing apparatus of lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2007-02-22 US disclosed
US-20070039500-A1 Manufacturing method of lithographic printing plate and manufacturing apparatus of lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2007-02-22 US disclosed
US-20070042293-A1 Including an aromatic diphosphonium compound along with an addition polymerization promoter, unsaturated compound, protective layeron an sluminium support; laser recording having excellent ink receptibility during printing and printing durability; strength; on-press development; image strength FUJI PHOTO FILM CO., LTD. 2007-02-22 US disclosed
US-20070042293-A1 Including an aromatic diphosphonium compound along with an addition polymerization promoter, unsaturated compound, protective layeron an sluminium support; laser recording having excellent ink receptibility during printing and printing durability; strength; on-press development; image strength FUJI PHOTO FILM CO., LTD. 2007-02-22 US disclosed
US-20070042275-A1 Composition for optical recording, optical recording medium, and production method thereof FUJI PHOTO FILM CO., LTD. 2007-02-22 US disclosed
US-20070042275-A1 Composition for optical recording, optical recording medium, and production method thereof FUJI PHOTO FILM CO., LTD. 2007-02-22 US disclosed
EP-0901996-B1 PROCESS FOR PRODUCING OPTICALLY ACTIVE AMINES MITSUI CHEMICALS INC (JP) 2006-02-01 EP disclosed
US-6222072-B1 RACTING IMINE WITH HYDRIDE REAGENT IN PRESENCE OF OPTICALLY ACTIVE METAL COMPOUND, WHEREIN HYDRIDE REAGENT IS A METAL HYDRIDE, REAGENT THAT UNDERGOES METAL EXCHANGE, METAL TRIALKOXY HYDRIDE COMPLEX OR METAL(TRICARBOXYLIC ACID)HYDRIDE MITSUI CHEMICALS INC. (JP) 2001-04-24 US disclosed
EP-0901996-A1 PROCESS FOR PRODUCING OPTICALLY ACTIVE AMINES Mitsui Chemicals, Inc. (JP) 1999-03-17 EP disclosed