Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ABL1 | P00519 | 4/20 | 0.71 |
| ▸ | ABCB1 | P08183 | 4/20 | 0.71 |
| ▸ | BCR | P11274 | 4/20 | 0.71 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.70 |
| ▸ | NPC1 | O15118 | 1/20 | 0.70 |
| ▸ | TP53 | P04637 | 1/20 | 0.70 |
| ▸ | CASP3 | P42574 | 1/20 | 0.70 |
| ▸ | RAB9A | P51151 | 1/20 | 0.70 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.70 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.70 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.70 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.70 |
| ▸ | CA1 | P00915 | 2/20 | 0.65 |
| ▸ | CA2 | P00918 | 2/20 | 0.65 |
| ▸ | CA7 | P43166 | 2/20 | 0.65 |
| ▸ | CA9 | Q16790 | 2/20 | 0.65 |
| ▸ | CA12 | O43570 | 1/20 | 0.65 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.65 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.64 |
| ▸ | HSD17B1 | P14061 | 1/20 | 0.60 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3743494 | 1.00 | ABL1 (0.71) | ABL1ABCB1BCRMAPK1NPC1 | |
| SCHEMBL197522 | 0.91 | CA1 (0.79) | ABL1ABCB1BCRMAPK1NPC1 | |
| SCHEMBL9151672 | 0.91 | CA1 (0.79) | ABL1ABCB1BCRMAPK1NPC1 | |
| SCHEMBL6733562 | 0.91 | CA1 (0.79) | ABL1ABCB1BCRMAPK1NPC1 | |
| SCHEMBL28102062 | 0.90 | ABL1 (0.73) | ABL1ABCB1BCRMAPK1NPC1 | |
| SCHEMBL19301040 | 0.90 | ABL1 (0.61) | ABL1ABCB1BCRMAPK1NPC1 | |
| SCHEMBL2274524 | 0.89 | ABL1 (0.79) | ABL1ABCB1BCRMAPK1NPC1 | |
| SCHEMBL24462151 | 0.88 | ABL1 (0.59) | ABL1ABCB1BCRMAPK1NPC1 | |
| SCHEMBL15679887 | 0.88 | ABL1 (0.59) | ABL1ABCB1BCRMAPK1NPC1 | |
| SCHEMBL22229667 | 0.88 | ABL1 (0.59) | ABL1ABCB1BCRMAPK1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7871755-B2 | Photosensitive composition | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-01-18 | — | — | US | disclosed |
| US-7871755-B2 | Photosensitive composition | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-01-18 | — | — | US | disclosed |
| US-7871755-B2 | Photosensitive composition | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-01-18 | — | — | US | disclosed |
| US-20090081582-A1 | irradiating a predetermined region of photosensitive layer, subjecting the photosensitive layer after baking to development treatment with an alkali aqueous solution to selectively remove the light-exposed part; has a photo-acid generator which generates an acid by the action of actinic radiation | KABUSHIKI KAISHA TOSHIBA | 2009-03-26 | — | — | US | disclosed |
| US-20090081582-A1 | irradiating a predetermined region of photosensitive layer, subjecting the photosensitive layer after baking to development treatment with an alkali aqueous solution to selectively remove the light-exposed part; has a photo-acid generator which generates an acid by the action of actinic radiation | KABUSHIKI KAISHA TOSHIBA | 2009-03-26 | — | — | US | disclosed |
| US-20090081582-A1 | irradiating a predetermined region of photosensitive layer, subjecting the photosensitive layer after baking to development treatment with an alkali aqueous solution to selectively remove the light-exposed part; has a photo-acid generator which generates an acid by the action of actinic radiation | KABUSHIKI KAISHA TOSHIBA | 2009-03-26 | — | — | US | disclosed |