SCHEMBL9227285

SCHEMBL9227285

CCOC(=O)CC[Si](C)(C)F

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.48
GAA P10253 2/20 0.48
MGAM O43451 1/20 0.48
SI P14410 1/20 0.48
MGAM2 Q2M2H8 1/20 0.48
ALDH1A1 P00352 5/20 0.44
TRPA1 O75762 1/20 0.44
LMNA P02545 2/20 0.42
POLB P06746 1/20 0.42
TSHR P16473 1/20 0.42
CYP4F2 P78329 2/20 0.40
CYP4A11 Q02928 2/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
L3MBTL1 Q9Y468 2/20 0.39
NR1I2 O75469 1/20 0.39
PGR P06401 1/20 0.39
ADORA3 P0DMS8 1/20 0.39
PTGS2 P35354 1/20 0.39
PDE4D Q08499 1/20 0.39
RAB9A P51151 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26454720 0.89 CYP1A2 (0.47) CYP1A2GAAMGAMSIMGAM2
SCHEMBL15092010 0.87 CYP1A2 (0.55) CYP1A2GAAMGAMSIMGAM2
SCHEMBL26454470 0.86 CYP1A2 (0.48) CYP1A2GAAMGAMSIMGAM2
SCHEMBL15091660 0.85 DGKA (0.44) CYP1A2ALDH1A1LMNAMAPT
SCHEMBL2885818 0.84 GAA (0.50) CYP1A2GAAMGAMSIMGAM2
SCHEMBL15091886 0.82 DGKA (0.50) ALDH1A1LMNATSHRMAPT
SCHEMBL13151035 0.82 CYP1A2 (0.48) CYP1A2GAAMGAMSIMGAM2
SCHEMBL15091885 0.81 NAAA (0.53)
SCHEMBL13151108 0.80 CYP1A2 (0.47) CYP1A2GAAMGAMSIMGAM2
SCHEMBL13151091 0.79 HTT (0.41) CYP1A2GAAALDH1A1LMNAPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230127105-A1 Nonaqueous Electrolytic Solution and Nonaqueous Electrolytic Solution Battery MITSUBISHI CHEMICAL CORPORATION (JP) 2023-04-27 US disclosed
US-20230127105-A1 Nonaqueous Electrolytic Solution and Nonaqueous Electrolytic Solution Battery MITSUBISHI CHEMICAL CORPORATION (JP) 2023-04-27 US disclosed
EP-2642579-B1 NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY ADEKA CORP (JP) 2017-07-26 EP disclosed
EP-2642580-B1 NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY ADEKA CORP (JP) 2017-03-29 EP disclosed
US-9023536-B2 Non-aqueous electrolyte secondary battery ADEKA CORPORATION (JP) 2015-05-05 US disclosed
US-9017866-B2 Non-aqueous electrolyte secondary battery ADEKA CORPORATION (JP) 2015-04-28 US disclosed
EP-2642580-A1 NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY Adeka Corporation (JP) 2013-09-25 EP disclosed
EP-2642579-A1 NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY Adeka Corporation (JP) 2013-09-25 EP disclosed
US-20130236777-A1 NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY ADEKA CORPORATION (JP) 2013-09-12 US disclosed
US-20130177822-A1 NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY ADEKA CORPORATION (JP) 2013-07-11 US disclosed
US-7799469-B2 electrolytic salt e.g. LiPF6 is dissolved in an organic solvent ( ethylene carbonate, vinyline carbonate, diethyl carbonate) and a silicon compound additive; increase of internal resistance in storage at high temperature; stable power souce for hybrid or battery cars using electrical power; green energy DENSO CORPORATION (JP) 2010-09-21 US disclosed
US-20070243470-A1 electrolytic salt e.g. LiPF6 is dissolved in an organic solvent ( ethylene carbonate, vinyline carbonate, diethyl carbonate) and a silicon compound additive; increase of internal resistance in storage at high temperature; stable power souce for hybrid or battery cars using electrical power; green energy DENSO CORPORATION (JP) 2007-10-18 US disclosed
EP-0378430-B1 Novel organosilicon compound and process for producing organosilicon compound AGENCY IND SCIENCE TECHN (JP) 1995-02-01 EP disclosed
US-5151538-A ORGANOSILICON COMPOUND AND PROCESS FOR PRODUCING ORGANOSILICON COMPOUND AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 1992-09-29 US disclosed
EP-0378430-A1 Novel organosilicon compound and process for producing organosilicon compound DIRECTOR-GENERAL OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 1990-07-18 EP disclosed