SCHEMBL9229754

SCHEMBL9229754

CC(C)c1cc(C(C)C)c(-c2cc(C(C)C)c(O)c(C(C)C)c2)c(C(C)C)c1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.64
CA2 P00918 2/20 0.64
GABRA1 P14867 6/20 0.61
GABRB2 P47870 3/20 0.61
GABRB1 P18505 5/20 0.54
FABP3 P05413 2/20 0.44
FABP4 P15090 2/20 0.44
FABP5 Q01469 1/20 0.42
FAAH O00519 1/20 0.41
LMNA P02545 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
HPGD P15428 1/20 0.41
TSHR P16473 1/20 0.41
GABRG2 P18507 1/20 0.41
PTGS1 P23219 1/20 0.41
SLC6A2 P23975 1/20 0.41
HTR2C P28335 1/20 0.41
GABRB3 P28472 1/20 0.41
GABRA5 P31644 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL94533 0.87 GABRA1 (0.77) CA1CA2GABRA1GABRB2GABRB1
Ammonia Solution, Strong SCHEMBL28098766 0.84 GABRA1 (0.74) CA1CA2GABRA1GABRB2GABRB1
SCHEMBL6847775 0.84 GABRA1 (0.52) CA1CA2GABRA1GABRB2GABRB1
SCHEMBL29560756 0.83 GABRA1 (0.50) CA1CA2GABRA1GABRB2GABRB1
SCHEMBL19621818 0.83 CA1 (0.77) CA1CA2GABRA1GABRB2GABRB1
SCHEMBL3920589 0.80 GABRA1 (0.47) CA1CA2GABRA1GABRB2GABRB1
SCHEMBL275427 0.79 CA1 (1.00) CA1CA2GABRA1GABRB2GABRB1
SCHEMBL6302922 0.78 CA1 (0.70) CA1CA2GABRA1GABRB2GABRB1
SCHEMBL978686 0.78 GABRA1 (0.48) CA1CA2GABRA1GABRB2GABRB1
SCHEMBL20591297 0.77 GABRA1 (0.47) CA1CA2GABRA1GABRB2GABRB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117099045-A Negative photosensitive resin composition, cured product, laminate, method for producing cured product, and semiconductor device 富士胶片株式会社 2023-11-21 CN disclosed
CN-102520583-A Photoresist compositions comprising acetals and ketals as solvents AZ ELECTRONIC MATERIALS JAPAN 2012-06-27 CN disclosed
CN-101218541-B Photoresist composition for imaging thick films AZ ELECTRONIC MATERIALS USA 2012-05-23 CN disclosed
EP-0677789-A1 Positive photoresist composition Fuji Photo Film Co., Ltd. (JP) 1995-10-18 EP disclosed