SCHEMBL6847775

SCHEMBL6847775

Cc1cc(-c2c(C(C)C)cc(C(C)C)cc2C(C)C)cc(C)c1O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 5/20 0.52
GABRB2 P47870 3/20 0.52
CA1 P00915 3/20 0.48
CA2 P00918 3/20 0.48
PTGS1 P23219 3/20 0.43
PTGS2 P35354 1/20 0.43
FABP3 P05413 2/20 0.41
FABP4 P15090 2/20 0.41
GABRB1 P18505 4/20 0.41
FABP5 Q01469 1/20 0.40
TRPA1 O75762 2/20 0.38
CACNA1C Q13936 1/20 0.38
ROCK2 O75116 1/20 0.36
LMNA P02545 3/20 0.36
CYP1A2 P05177 2/20 0.34
SLC6A2 P23975 2/20 0.34
HTR2B P41595 2/20 0.34
FAAH O00519 1/20 0.34
CYP3A4 P08684 1/20 0.34
HPGD P15428 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9229754 0.84 CA1 (0.64) GABRA1GABRB2CA1CA2PTGS1
SCHEMBL27353893 0.81 GABRA1 (0.54) GABRA1GABRB2CA1CA2PTGS1
SCHEMBL27551548 0.80 GABRA1 (0.47) GABRA1GABRB2PTGS1FABP3FABP4
SCHEMBL29560756 0.80 GABRA1 (0.50) GABRA1GABRB2CA1CA2PTGS1
SCHEMBL758758 0.80 CA1 (0.52) GABRA1GABRB2CA1CA2PTGS1
SCHEMBL30467045 0.79 GABRA1 (0.65) GABRA1GABRB2CA1CA2PTGS1
SCHEMBL6943696 0.79 GABRA1 (0.65) GABRA1GABRB2CA1CA2PTGS1
SCHEMBL2754950 0.79 PTGS1 (0.55) GABRA1GABRB2CA1CA2PTGS1
SCHEMBL3920589 0.77 GABRA1 (0.47) GABRA1GABRB2CA1CA2FABP3
SCHEMBL25766408 0.76 ROCK2 (0.41) GABRA1GABRB2FABP3FABP4FABP5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117099045-A Negative photosensitive resin composition, cured product, laminate, method for producing cured product, and semiconductor device 富士胶片株式会社 2023-11-21 CN disclosed
CN-102520583-A Photoresist compositions comprising acetals and ketals as solvents AZ ELECTRONIC MATERIALS JAPAN 2012-06-27 CN disclosed
CN-101218541-B Photoresist composition for imaging thick films AZ ELECTRONIC MATERIALS USA 2012-05-23 CN disclosed
CN-100470365-C Positive imaging material FUJI PHOTO FILM CO LTD (JP) 2009-03-18 CN disclosed
CN-1286905-C Novolak resin mixture and photosensitive composition comprising the same AZ ELECTRONIC MATERIALS JAPAN (JP) 2006-11-29 CN disclosed
CN-1650232-A Photoresist compositions comprising acetals and ketals as solvents CLARIANT INT LTD (CH) 2005-08-03 CN disclosed
CN-1646628-A Novolak resin mixture and photosensitive composition comprising the same AZ ELECTRONIC MATERIALS JAPAN (JP) 2005-07-27 CN disclosed
US-6716565-B2 APPLICABLE TO IMAGE-FORMING MATERIALS SUCH AS THREE-DIMENSIONAL MODELLING BY LIGHT, HOLOGRAPHY, LITHOGRAPHIC PRINTING PLATES, COLOR PROOFS, PHOTORESISTS AND COLOR FILTERS, AND INKS, PAINTS AND ADHESIVES FUJI PHOTO FILM CO., LTD. (JP) 2004-04-06 US disclosed
US-20030057610-A1 Applicable to image-forming materials such as three-dimensional modelling by light, holography, lithographic printing plates, color proofs, photoresists and color filters, and inks, paints and adhesives FUJIFILM CORPORATION (JP) 2003-03-27 US disclosed