SCHEMBL92300

SCHEMBL92300

CCC(C)c1ccc(C(=O)OCOC2Cc3ccccc3C2)cc1

nearest known ligand 0.39

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
FFAR1 O14842 1/20 0.39
NPSR1 Q6W5P4 1/20 0.38
MAPT P10636 2/20 0.37
BCHE P06276 2/20 0.37
ALDH1A1 P00352 1/20 0.37
TSHR P16473 1/20 0.37
OPRD1 P41143 1/20 0.36
MEN1 O00255 3/20 0.36
KMT2A Q03164 3/20 0.36
LMNA P02545 1/20 0.35
NTRK1 P04629 1/20 0.35
NTRK2 Q16620 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
NPY2R P49146 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14825875 0.77 NPSR1 (0.39) FFAR1NPSR1MAPTALDH1A1TSHR
SCHEMBL71690 0.76 TAS1R3 (0.39) MAPTALDH1A1OPRD1MEN1KMT2A
SCHEMBL92329 0.76 TSHR (0.37) ALDH1A1TSHRTDP1
SCHEMBL16746690 0.74 TSHR (0.45) NPSR1MAPTALDH1A1TSHRMEN1
SCHEMBL1789210 0.74 CA1 (0.59) NPSR1MAPTALDH1A1TSHRMEN1
SCHEMBL15958399 0.73 TSHR (0.40) FFAR1NPSR1MAPTALDH1A1TSHR
SCHEMBL23898835 0.72 TSHR (0.49) NPSR1MAPTALDH1A1TSHRMEN1
SCHEMBL13144181 0.72 TSHR (0.49) NPSR1MAPTALDH1A1TSHRMEN1
SCHEMBL26673480 0.72 TSHR (0.49) NPSR1MAPTALDH1A1TSHRMEN1
SCHEMBL13144171 0.72 KMT2A (0.63) MAPTALDH1A1TSHRMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8129086-B2 Polymerizable compound, polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-06 US disclosed
US-20090297979-A1 Polymerizable compound, polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-12-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090297979-A1 Polymerizable compound, polymer, positive resist composition, and patterning process using the same PRRC2A, PUF60, POLR2B FFAR1 1633/4885NPSR1 2339/4885MAPT 2552/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.