⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL92328 | 0.97 | SHBG (0.36) | — | |
| SCHEMBL29255934 | 0.97 | SHBG (0.36) | — | |
| SCHEMBL105827 | 0.97 | SHBG (0.36) | — | |
| SCHEMBL4018245 | 0.94 | — | — | |
| SCHEMBL19773990 | 0.91 | DEGS1 (0.33) | — | |
| SCHEMBL4546673 | 0.87 | — | — | |
| SCHEMBL10121187 | 0.87 | DEGS1 (0.36) | — | |
| SCHEMBL74849 | 0.87 | DEGS1 (0.36) | — | |
| Ammonia Solution, Strong SCHEMBL8076876 | 0.84 | — | — | |
| SCHEMBL10956095 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1431 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12631966-B2 | Method for forming photoresist patterns | SAMSUNG SDI CO., LTD. (KR) | 2026-05-19 | — | — | US | claimed |
| US-12590221-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-03-31 | — | — | US | claimed |
| US-12554199-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-02-17 | — | — | US | claimed |
| US-20230026721-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230026579-A1 | METHOD FOR FORMING PHOTORESIST PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230021469-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230028244-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20230024422-A1 | RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-11127974-B2 | Method of preparing sulfide-based solid electrolyte, sulfide-based solid electrolyte prepared therefrom, and solid secondary battery including the sulfide electrolyte | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-09-21 | — | — | US | claimed |
| US-10562991-B2 | Developer, pattern forming method, and electronic device manufacturing method | FUJIFILM CORPORATION (JP) | 2020-02-18 | — | — | US | claimed |
| US-20190348707-A1 | METHOD OF PREPARING SULFIDE-BASED SOLID ELECTROLYTE, SULFIDE-BASED SOLID ELECTROLYTE PREPARED THEREFROM, AND SOLID SECONDARY BATTERY INCLUDING THE SULFIDE ELECTROLYTE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2019-11-14 | — | — | US | claimed |
| US-12631966-B2 | Method for forming photoresist patterns | SAMSUNG SDI CO., LTD. (KR) | 2026-05-19 | — | — | US | disclosed |
| US-12624318-B2 | Cleaning agent composition and cleaning method | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-12 | — | — | US | disclosed |
| US-12590221-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-03-31 | — | — | US | disclosed |
| US-20260071152-A1 | CLEANING METHOD | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-12 | — | — | US | disclosed |
| EP-0232776-B1 | 2,5,6,7-TETRANOR-4,8-INTER-M-PHENYLENE PGI2 DERIVATIVES | TORAY INDUSTRIES, INC. (JP) | 1990-10-24 | — | — | EP | disclosed |
| EP-0389162-A1 | 2,5,6,7-Tetranor-4,8-inter-m-phenylene PGI2 derivatives | TORAY INDUSTRIES, INC. (JP) | 1990-09-26 | — | — | EP | disclosed |
| US-4775692-A | ANTILIPEMIC, ANTICOAGULANT, HYPOTENSIVE, ANTISECRETORY AND ANTIULCER AGENT | TORAY INDUSTRIES, INC. (JP) | 1988-10-04 | — | — | US | disclosed |
| EP-0284005-A2 | Method of production of polyolefins | IDEMITSU PETROCHEMICAL CO. LTD. (JP) | 1988-09-28 | — | — | EP | disclosed |
| EP-0232776-A2 | 2,5,6,7-tetranor-4,8-inter-m-phenylene PGI2 derivatives | TORAY INDUSTRIES, INC. (JP) | 1987-08-19 | — | — | EP | disclosed |