SCHEMBL92328

SCHEMBL92328

CC(C)OC1CCCCC1

nearest known ligand 0.43

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.36
EPHX1 P07099 3/20 0.33
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
ACHE P22303 1/20 0.33
CA12 O43570 1/20 0.32
CA9 Q16790 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
CYP19A1 P11511 1/20 0.32
DEGS1 O15121 1/20 0.30
ADH1B P00325 1/20 0.30
ADH1C P00326 1/20 0.30
ADH1A P07327 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL105827 1.00 SHBG (0.36) SHBGEPHX1CA1CA2ACHE
SCHEMBL29255934 1.00 SHBG (0.36) SHBGEPHX1CA1CA2ACHE
SCHEMBL92304 0.97
SCHEMBL4018245 0.91
SCHEMBL19773990 0.88 DEGS1 (0.33) DEGS1
SCHEMBL12227901 0.85 ALDH1A1 (0.38) SHBGDEGS1
SCHEMBL10121187 0.84 DEGS1 (0.36) DEGS1
SCHEMBL4546673 0.84
SCHEMBL74849 0.84 DEGS1 (0.36) DEGS1
Propylene Glycol SCHEMBL9135001 0.84 TDP1 (0.42) SHBGEPHX1NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1697 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12631966-B2 Method for forming photoresist patterns SAMSUNG SDI CO., LTD. (KR) 2026-05-19 US claimed
US-12590221-B2 Resist topcoat composition, and method of forming patterns using the composition SAMSUNG SDI CO., LTD. (KR) 2026-03-31 US claimed
US-12554199-B2 Resist topcoat composition, and method of forming patterns using the composition SAMSUNG SDI CO., LTD. (KR) 2026-02-17 US claimed
CN-116297710-A Multifunctional pressure-gas sensor and preparation method and application thereof 延边大学 2023-06-23 CN claimed
US-20230026579-A1 METHOD FOR FORMING PHOTORESIST PATTERNS SAMSUNG SDI CO., LTD. (KR) 2023-01-26 US claimed
US-20230021469-A1 RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-01-26 US claimed
US-20230028244-A1 RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION SAMSUNG SDI CO., LTD. (KR) 2023-01-26 US claimed
US-20230026721-A1 RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION SAMSUNG SDI CO., LTD. (KR) 2023-01-26 US claimed
US-20230024422-A1 RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION SAMSUNG SDI CO., LTD. (KR) 2023-01-26 US claimed
US-11127974-B2 Method of preparing sulfide-based solid electrolyte, sulfide-based solid electrolyte prepared therefrom, and solid secondary battery including the sulfide electrolyte SAMSUNG ELECTRONICS CO., LTD. (KR) 2021-09-21 US claimed
CN-102917708-A Process for preparing macrolides and ketolides and intermediates thereof CEMPRA PHARMACEUTICALS INC 2013-02-06 CN claimed
CN-102766181-A Preparation method of 6-o-substituted erythromycin derivative SHANGHAI INST PHARM INDUSTRY 2012-11-07 CN claimed
WO-2011146829-A1 PROCESSES FOR PREPARING MACROLIDES AND KETOLIDES AND INTERMEDIATES THEREFOR CEMPRA PHARMACEUTICALS, INC. (US) 2011-11-24 WO claimed
CN-101619085-A Erythromycin derivative and application as tumor cell proliferation inhibitor thereof UNIV SHENYANG PHARMACEUTICAL 2010-01-06 CN claimed
EP-1007530-A1 6-O-SUBSTITUTED ERYTHROMYCIN COMPOUNDS AND METHOD FOR MAKING SAME ABBOTT LABORATORIES (US) 2000-06-14 EP claimed
US-6075011-A 6-O-substituted erythromycin compounds and method for making same ABBOTT LABORATORIES (US) 2000-06-13 US claimed
EP-0918783-A1 6-O-SUBSTITUTED ERYTHROMYCINS AND METHOD FOR MAKING THEM ABBOTT LABORATORIES (US) 1999-06-02 EP claimed
WO-1997042204-A1 6-O-SUBSTITUTED ERYTHROMYCINS AND METHOD FOR MAKING THEM ABBOTT LABORATORIES (US) 1997-11-13 WO claimed
WO-1997042206-A1 6-O-SUBSTITUTED ERYTHROMYCIN COMPOUNDS AND METHOD FOR MAKING SAME ABBOTT LABORATORIES (US) 1997-11-13 WO claimed
US-4990688-A Extraction from a mixture containing an aromatic sulfonic acid using an ether/phenol extractant BASF AKTIENGESELLSCHAFT (DE) 1991-02-05 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230024422-A1 RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION TOP1, TOP2A, FTO SHBG 1843/4885EPHX1 1030/4885CA1 345/4885
US-12631966-B2 Method for forming photoresist patterns FTO, SOAT1, SOAT2 SHBG 3131/4885EPHX1 1589/4885CA1 285/4885
US-12554199-B2 Resist topcoat composition, and method of forming patterns using the composition FGFR2, FGFR1, FDFT1 SHBG 2684/4885EPHX1 2868/4885CA1 1296/4885
US-20230021469-A1 RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION COL2A1, TOP1, TOP2A SHBG 1908/4885EPHX1 2043/4885CA1 618/4885
US-12590221-B2 Resist topcoat composition, and method of forming patterns using the composition RER1, TOP1, RRS1 SHBG 1213/4885EPHX1 1015/4885CA1 745/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.