SCHEMBL924245

SCHEMBL924245

CCCCCCCC(CCCCCC)(CCCCCC)C(CCCCCC)(CCCCCC)C(=O)O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.44
LPAR1 Q92633 1/20 0.44
LPAR3 Q9UBY5 1/20 0.44
GPR84 Q9NQS5 7/20 0.43
PPARG P37231 7/20 0.43
PPARD Q03181 7/20 0.43
PPARA Q07869 7/20 0.43
HDAC11 Q96DB2 5/20 0.43
TSHR P16473 4/20 0.43
PTPN1 P18031 3/20 0.43
ALDH1A1 P00352 2/20 0.43
TLR2 O60603 2/20 0.43
TDP1 Q9NUW8 2/20 0.43
FABP4 P15090 2/20 0.43
SLC22A6 Q4U2R8 1/20 0.43
SLC22A8 Q8TCC7 1/20 0.43
MEN1 O00255 1/20 0.43
ESR1 P03372 1/20 0.43
ALOX15 P16050 1/20 0.43
PDE4A P27815 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL993403 1.00 CES2 (0.44) CES2LPAR1LPAR3GPR84PPARG
SCHEMBL4584710 1.00 CES2 (0.44) CES2LPAR1LPAR3GPR84PPARG
SCHEMBL1061636 1.00 CES2 (0.44) CES2LPAR1LPAR3GPR84PPARG
SCHEMBL1127820 1.00 CES2 (0.44) CES2LPAR1LPAR3GPR84PPARG
SCHEMBL5665394 1.00 CES2 (0.44) CES2LPAR1LPAR3GPR84PPARG
SCHEMBL2117712 1.00 CES2 (0.44) CES2LPAR1LPAR3GPR84PPARG
SCHEMBL2119178 1.00 CES2 (0.44) CES2LPAR1LPAR3GPR84PPARG
SCHEMBL28421147 0.98 CES2 (0.42) CES2LPAR1LPAR3GPR84PPARG
SCHEMBL28279462 0.98 CES2 (0.42) CES2LPAR1LPAR3GPR84PPARG
Ammonia Solution, Strong SCHEMBL28638428 0.96 CES2 (0.41) CES2LPAR1LPAR3GPR84PPARG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230055665-A1 DELIVERY CARRIER INTO CELL ITO, KABUSIKIKAISYA (JP) 2023-02-23 US claimed
US-20250180989-A1 COMPOSITION FOR PRETREATMENT NISSAN CHEMICAL CORPORATION (JP) 2025-06-05 US disclosed
CN-119970527-A Liposome-containing composition for cosmetics 富士胶片株式会社 2025-05-13 CN disclosed
CN-119698464-A In vitro culture method for inducing follicles from primate embryonic ovarian cells 国立大学法人京都大学 2025-03-25 CN disclosed
CN-115135307-B Cell delivery vehicle 株式会社ITO 2024-11-22 CN disclosed
CN-118830065-A Pretreatment composition 日产化学株式会社 2024-10-22 CN disclosed
CN-118384059-A Composite ceramide anti-aging moisturizing water and preparation method thereof 广州伊尔美生物科技有限公司 2024-07-26 CN disclosed
WO-2024071313-A1 COSMETIC COMPOSITION AND COSMETIC 株式会社日本触媒 2024-04-04 WO disclosed
CN-112120957-B Oily cosmetic 富士胶片株式会社 2024-03-29 CN disclosed
CN-113509478-B Hair growth promoter 金印株式会社 2024-01-26 CN disclosed
EP-2474862-A1 RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2012-07-11 EP disclosed
EP-2475000-A1 PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME Wako Pure Chemical Industries, Ltd. (JP) 2012-07-11 EP disclosed
US-20120172274-A1 RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING THE COMPOSITION WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2012-07-05 US disclosed
US-20120157368-A1 PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2012-06-21 US disclosed
US-8020745-B2 Solder ball HITACHI METALS, LTD. (JP) 2011-09-20 US disclosed
US-20110021400-A1 SEMICONDUCTOR SURFACE TREATING AGENT COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SURFACE USING THE SEMICONDUCTOR SURFACE TREATING AGENT COMPOSITION WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2011-01-27 US disclosed
US-20100330014-A1 COMPOSITION FOR EXTERNAL APPLICATION ON SKIN, AND SKIN-WHITENING COSMETIC TBC GROUP CO., LTD. (JP) 2010-12-30 US disclosed
EP-2249206-A1 SEMICONDUCTOR SURFACE TREATING AGENT COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SURFACE USING THE SEMICONDUCTOR SURFACE TREATING AGENT COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2010-11-10 EP disclosed
US-20100127044-A1 SOLDER BALL HITACHI METALS, LTD. (JP) 2010-05-27 US disclosed
US-20050214240-A1 Cosmetic preparation KOSE CORPORATION (JP) 2005-09-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230055665-A1 DELIVERY CARRIER INTO CELL CTSA, ATG4A, ATG7 CES2 1421/4885LPAR1 1419/4885LPAR3 2303/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.