SCHEMBL9243221

SCHEMBL9243221

O=C(NCCO)c1c(O)ccc2ccccc12

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.55
ALDH1A1 P00352 4/20 0.55
MAPT P10636 1/20 0.55
CASP1 P29466 1/20 0.55
CASP7 P55210 1/20 0.55
ALOX15 P16050 1/20 0.50
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
PRMT5 O14744 1/20 0.47
WDR77 Q9BQA1 1/20 0.47
CACNA1B Q00975 1/20 0.47
APBA1 Q02410 1/20 0.47
ABCG2 Q9UNQ0 2/20 0.46
CYP1A2 P05177 2/20 0.44
POLR1A O95602 1/20 0.44
IDO1 P14902 1/20 0.44
HPGD P15428 3/20 0.44
HSD17B10 Q99714 2/20 0.44
GLA P06280 1/20 0.44
GAA P10253 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL11790729 0.85 ALOX15 (0.48) KDM4EALDH1A1MAPTALOX15MEN1
Hydrochloric Acid SCHEMBL9244140 0.82 HTT (0.51) KDM4EALDH1A1ALOX15CYP1A2HPGD
SCHEMBL10670557 0.82 KDM4E (0.64) KDM4EALDH1A1MAPTCASP1CASP7
SCHEMBL11120656 0.81 NAAA (0.58) HPGD
SCHEMBL6536624 0.81 NAAA (0.58) HPGD
SCHEMBL11117801 0.81 NAAA (0.58) HPGD
SCHEMBL11118226 0.81 NAAA (0.58) HPGD
SCHEMBL11119851 0.81 NAAA (0.58) HPGD
SCHEMBL1639535 0.80 ALOX15 (0.55) KDM4EALDH1A1MAPTALOX15MEN1
SCHEMBL8358481 0.80 ALOX15 (0.54) KDM4EALDH1A1ALOX15MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5478689-A With coupler contained in microcapsules made of alkali-soluble resin RICOH COMPANY, LTD. (JP) 1995-12-26 US disclosed
US-4467024-A Process for the production of thermo-developable type diazo copying material RICOH CO., LTD. (JP) 1984-08-21 US disclosed
US-4416967-A SUBSTRATE, PRECOAT LAYER OF SILICA AND COPOLYMER OF ACRYLIC, OXY, RICOH CO., LTD. (JP) 1983-11-22 US disclosed