SCHEMBL9244141

SCHEMBL9244141

O=C(CC(O)C(=O)Oc1ccccc1)Oc1ccccc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ATM Q13315 2/20 0.45
L3MBTL1 Q9Y468 2/20 0.45
CYP19A1 P11511 1/20 0.45
ADRB2 P07550 1/20 0.42
ADRB1 P08588 1/20 0.42
ADRB3 P13945 1/20 0.42
ELANE P08246 2/20 0.41
PRSS1 P07477 1/20 0.40
PRSS2 P07478 1/20 0.40
PRSS3 P35030 1/20 0.40
TDP1 Q9NUW8 1/20 0.39
ALDH1A1 P00352 2/20 0.39
MAPT P10636 2/20 0.39
ALOX15 P16050 2/20 0.38
HPGD P15428 1/20 0.38
HSD17B10 Q99714 1/20 0.38
MMP12 P39900 1/20 0.38
MMP13 P45452 1/20 0.38
KMT2A Q03164 1/20 0.37
CYP1A2 P05177 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29163224 0.87 ATM (0.46) ATML3MBTL1CYP19A1ADRB2ADRB1
SCHEMBL11198308 0.84 KMT2A (0.39) ADRB2ADRB1ADRB3ELANETDP1
SCHEMBL6934398 0.83 ATM (0.46) ATML3MBTL1CYP19A1ELANEPRSS1
SCHEMBL27833901 0.82 CYP19A1 (0.49) ATML3MBTL1CYP19A1ELANEPRSS1
SCHEMBL688988 0.82 CYP3A4 (0.51) ADRB2ADRB1ADRB3KMT2A
SCHEMBL5198959 0.81 ATM (0.47) ATML3MBTL1CYP19A1ADRB2ADRB1
SCHEMBL7191881 0.80 ATM (0.39) ATML3MBTL1ADRB2ADRB1ADRB3
SCHEMBL3627609 0.80 ELANE (0.47) ATML3MBTL1CYP19A1ELANEALDH1A1
SCHEMBL7709512 0.80 ATM (0.44) ATML3MBTL1CYP19A1ELANEPRSS1
SCHEMBL7105263 0.79 ATM (0.46) ATML3MBTL1CYP19A1ADRB2ADRB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106604935-B Method for producing terminal-modified conjugated diene polymer, rubber composition, and tire 株式会社普利司通 2019-02-22 CN disclosed
CN-106604935-A Method for producing terminal-modified conjugated diene polymer, rubber composition, and tire 株式会社普利司通 2017-04-26 CN disclosed
CN-101900939-B Negative resist composition and patterning process using the same SHINETSU CHEMICAL CO 2013-10-09 CN disclosed
CN-101762981-B Chemically amplified positive resist composition and resist patterning process SHINETSU CHEMICAL CO 2013-04-17 CN disclosed
CN-101900939-A Negative resist composition and patterning process using the same SHINETSU CHEMICAL CO 2010-12-01 CN disclosed
CN-101842746-A Photoresist cleaning agent ANJI MICROELECTRONICS SHANGHAI 2010-09-22 CN disclosed
CN-101762981-A Chemically amplified positive resist composition and resist patterning process SHINETSU CHEMICAL CO 2010-06-30 CN disclosed
EP-0493187-B1 Process for the stereoselective transformation of a diol to an alcohol SEPRACOR INC (US) 1995-04-26 EP disclosed
US-5286899-A Process for the stereoselective transformation of a diol to an alcohol SEPRACOR, INC. (US) 1994-02-15 US disclosed
US-5189200-A PROCESS FOR THE STEREOSELECTIVE TRANSFORMATION OF A DIOL TO AN ALCOHOL SEPRACOR, INC. (US) 1993-02-23 US disclosed
EP-0493187-A1 Process for the stereoselective transformation of a diol to an alcohol SEPRACOR, INC. (US) 1992-07-01 EP disclosed