SCHEMBL9249101

SCHEMBL9249101

Cc1ccc(C(=O)O)c(C)c1C(=O)O.[NaH]

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HAAO P46952 1/20 0.42
▸ CYP1A2 P05177 2/20 0.42
▸ ALDH1A1 P00352 4/20 0.42
▸ KDM4E B2RXH2 1/20 0.41
▸ HPGD P15428 1/20 0.41
▸ HSD17B10 Q99714 1/20 0.41
▸ NOTUM Q6P988 2/20 0.40
▸ TDP1 Q9NUW8 2/20 0.39
▸ CYP3A4 P08684 2/20 0.39
▸ CYP2C9 P11712 2/20 0.39
▸ KMT2A Q03164 2/20 0.39
▸ MCL1 Q07820 1/20 0.39
▸ TSHR P16473 1/20 0.39
▸ L3MBTL1 Q9Y468 1/20 0.39
▸ GABRP O00591 1/20 0.38
▸ GABRD O14764 1/20 0.38
▸ GABRA1 P14867 1/20 0.38
▸ GABRB1 P18505 1/20 0.38
▸ GABRG2 P18507 1/20 0.38
▸ GABRB3 P28472 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL195882 0.98 CYP1A2 (0.44) HAAOCYP1A2ALDH1A1KDM4EHPGD
Ammonia Solution, Strong SCHEMBL28622226 0.96 HAAO (0.42) HAAOCYP1A2ALDH1A1KDM4EHPGD
SCHEMBL9408349 0.96 HAAO (0.42) HAAOCYP1A2ALDH1A1KDM4EHPGD
Water SCHEMBL27552128 0.96 HAAO (0.42) HAAOCYP1A2ALDH1A1KDM4EHPGD
Sulfuric Acid SCHEMBL4611662 0.92 HAAO (0.38) HAAOCYP1A2ALDH1A1KDM4EHPGD
Cyclohexane SCHEMBL9558619 0.92 HAAO (0.40) HAAOCYP1A2ALDH1A1KDM4EHPGD
SCHEMBL27886205 0.88 HAAO (0.38) HAAOCYP1A2ALDH1A1KDM4EHPGD
Sulfuric Acid SCHEMBL4611664 0.87 METAP2 (0.39) HAAOCYP1A2ALDH1A1KDM4EHPGD
SCHEMBL6574602 0.87 RXRB (0.38) HAAOCYP1A2ALDH1A1KDM4EHPGD
Sulfuric Acid SCHEMBL4611666 0.85 METAP2 (0.38) HAAOCYP1A2ALDH1A1KDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115335482-A Adhesive composition, adhesive sheet, laminate, and printed wiring board 东洋纺株式会社 2022-11-11 — — CN disclosed
US-5407981-A Reacting ester of dibasic acid, short chain diol,long chain polyglycol, alkali salt of dialkylsulfoisophthalate, stabilizers and alkali salt of phenol; for extrusion, blow molding CHEIL SYNTHETICS INC. (KR) 1995-04-18 — — US disclosed
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