Styrene

Styrene

SCHEMBL9251331

C=Cc1ccccc1.O=C(O)Cl

nearest known ligand 0.70

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 4/20 0.70
▸ TSHR P16473 1/20 0.70
▸ LMNA P02545 3/20 0.44
▸ HDAC3 O15379 2/20 0.44
▸ HDAC4 P56524 2/20 0.44
▸ HDAC1 Q13547 2/20 0.44
▸ HDAC2 Q92769 2/20 0.44
▸ HDAC8 Q9BY41 2/20 0.44
▸ HDAC6 Q9UBN7 2/20 0.44
▸ PLIN1 O60240 2/20 0.44
▸ MAPT P10636 2/20 0.44
▸ RECQL P46063 2/20 0.44
▸ PLIN5 Q00G26 2/20 0.44
▸ ABHD5 Q8WTS1 2/20 0.44
▸ AKT1 P31749 1/20 0.44
▸ TNKS O95271 1/20 0.44
▸ HCAR2 Q8TDS4 1/20 0.44
▸ HDAC7 Q8WUI4 1/20 0.44
▸ HDAC10 Q969S8 1/20 0.44
▸ HDAC11 Q96DB2 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Styrene SCHEMBL1456974 0.95 ALDH1A1 (0.70) ALDH1A1TSHRLMNAHDAC3HDAC4
Styrene SCHEMBL7178337 0.91 ALDH1A1 (0.58) ALDH1A1TSHRLMNAHDAC3HDAC4
Styrene SCHEMBL2337337 0.91 ALDH1A1 (0.58) ALDH1A1TSHRLMNAHDAC3HDAC4
Styrene SCHEMBL28223123 0.91 ALDH1A1 (0.64) ALDH1A1TSHRLMNAHDAC3HDAC4
Styrene SCHEMBL272448 0.90 ALDH1A1 (0.78) ALDH1A1TSHRLMNAHDAC3HDAC4
Styrene SCHEMBL1955286 0.90 ALDH1A1 (0.78) ALDH1A1TSHRLMNAHDAC3HDAC4
Styrene SCHEMBL5552245 0.89 ALDH1A1 (0.61) ALDH1A1TSHRLMNAHDAC3HDAC4
Styrene SCHEMBL3468164 0.87 ALDH1A1 (0.74) ALDH1A1TSHRLMNAHDAC3HDAC4
Styrene SCHEMBL9011439 0.87 ALDH1A1 (0.74) ALDH1A1TSHRLMNAHDAC3HDAC4
Styrene SCHEMBL15421310 0.87 ALDH1A1 (0.74) ALDH1A1TSHRLMNAHDAC3HDAC4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111138611-A Preparation method and application of magnetic sulfonated polystyrene molecular brush 河北科技大学 2020-05-12 — — CN claimed
EP-0276717-B1 Method of forming a fine resist pattern in electron beam or x-ray lithography FUJITSU LTD (JP) 1995-03-15 — — EP claimed
CN-111744464-B Adsorbent with bifunctional ligand and preparation method thereof 北京中科太康科技有限公司 2023-03-24 — — CN disclosed
CN-111138611-A Preparation method and application of magnetic sulfonated polystyrene molecular brush 河北科技大学 2020-05-12 — — CN disclosed
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