Bromide

Bromide

SCHEMBL9253240

Br.[H+].[I-]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4

The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL29077788 0.82
Iodide SCHEMBL7356 0.82
Bromide SCHEMBL27497036 0.82
Bromide SCHEMBL2144385 0.82
Iodide SCHEMBL9115513 0.82
Bromide SCHEMBL23326424 0.82
Iodide SCHEMBL129378 0.82
Bromide SCHEMBL9119402 0.67
Water SCHEMBL3894020 0.67
Bromide SCHEMBL3456702 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0339580-B1 A vacuum processing reactor APPLIED MATERIALS INC (US) 1995-02-22 EP disclosed
US-5215619-A Magnetic field-enhanced plasma etch reactor APPLIED MATERIALS, INC. (US) 1993-06-01 US disclosed
EP-0339580-A2 A vacuum processing reactor APPLIED MATERIALS, INC. (US) 1989-11-02 EP disclosed
US-4842683-A Magnetic field-enhanced plasma etch reactor APPLIED MATERIALS, INC. (US) 1989-06-27 US disclosed