Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.60 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.59 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.59 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.53 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | CES2 | O00748 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL3457781 | 1.00 | TSHR (0.60) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| Methacrylic Acid SCHEMBL7627265 | 0.98 | TSHR (0.62) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| Methacrylic Acid SCHEMBL9779546 | 0.95 | TSHR (0.57) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| Methacrylic Acid SCHEMBL28047771 | 0.94 | TSHR (0.53) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| Methacrylic Acid SCHEMBL28047677 | 0.92 | TSHR (0.55) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| Methacrylic Acid SCHEMBL1313296 | 0.91 | ALDH1A1 (0.58) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| Methacrylic Acid SCHEMBL1405658 | 0.91 | ALDH1A1 (0.58) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| Methacrylic Acid SCHEMBL449865 | 0.90 | SMN1; SMN2 (0.69) | TSHRALDH1A1TDP1SMN1; SMN2 | |
| Etoglucid SCHEMBL9639500 | 0.90 | ALDH1A1 (0.56) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| Methacrylic Acid SCHEMBL9779665 | 0.90 | ALDH1A1 (0.56) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100163812-A1 | INK COMPOSITION FOR COLOR FILTER | LG CHEM, LTD. (KR) | 2010-07-01 | — | — | US | claimed |
| EP-0738608-A2 | Curable compositions and their use for the formation of a printing material | CANON KABUSHIKI KAISHA (JP) | 1996-10-23 | — | — | EP | claimed |
| US-20240101742-A1 | LIVING RADICAL POLYMER, COMPOSITION, RESIN-COATED PIGMENT, AND METHOD FOR PRODUCING LIVING RADICAL POLYMER | NOF CORPORATION (JP) | 2024-03-28 | — | — | US | disclosed |
| US-20240085784-A1 | ORGANIC EL DISPLAY DEVICE | TOYO INK SC HOLDINGS CO., LTD. (JP) | 2024-03-14 | — | — | US | disclosed |
| US-20240027889-A1 | METAL OXIDE FILM-FORMING COMPOSITION, METHOD FOR PRODUCING METAL OXIDE FILMS USING SAME, AND METHOD FOR REDUCING VOLUME SHRINKAGE RATIO OF METAL OXIDE FILMS | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20230416924-A1 | COMPOSITION FOR METAL OXIDE FILM FORMATION, METHOD FOR PRODUCING COMPOSITION FOR METAL OXIDE FILM FORMATION, AND METHOD FOR PRODUCING METAL OXIDE FILM USING THE COMPOSITION FOR METAL OXIDE FILM FORMATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-12-28 | — | — | US | disclosed |
| WO-2023249045-A1 | PHOTOSENSITIVE COMPOSITION FOR ORGANIC EL DISPLAY DEVICE AND ORGANIC EL DISPLAY DEVICE, | 東洋インキＳＣホールディングス株式会社 | 2023-12-28 | — | — | WO | disclosed |
| EP-4286422-A1 | LIVING RADICAL POLYMER, COMPOSITION, RESIN-COATED PIGMENT, AND METHOD FOR PRODUCING LIVING RADICAL POLYMER | NOF Corporation (JP) | 2023-12-06 | — | — | EP | disclosed |
| EP-4257644-A1 | METAL OXIDE FILM-FORMING COMPOSITION, METHOD FOR PRODUCING METAL OXIDE FILMS USING SAME, AND METHOD FOR REDUCING VOLUME SHRINKAGE RATIO OF METAL OXIDE FILMS | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-11 | — | — | EP | disclosed |
| WO-2023167026-A1 | DIKETOPYRROLOPYRROLE PIGMENT, PIGMENT COMPOSITION, COLORED COMPOSITION, COLOR FILTER, AND SENSOR | 東洋インキＳＣホールディングス株式会社 | 2023-09-07 | — | — | WO | disclosed |
| WO-2023157919-A1 | INFRARED PASS FILTER, COLORING COMPOSITION, FILTER FOR SOLID-STATE IMAGING ELEMENT, AND SOLID-STATE IMAGING ELEMENT | 凸版印刷株式会社 | 2023-08-24 | — | — | WO | disclosed |
| EP-0738608-A2 | Curable compositions and their use for the formation of a printing material | CANON KABUSHIKI KAISHA (JP) | 1996-10-23 | — | — | EP | disclosed |
| EP-0709438-A1 | Active energy ray-curable composition recording medium and image-forming method employing the same | CANON KABUSHIKI KAISHA (JP) | 1996-05-01 | — | — | EP | disclosed |
| US-5112723-A | Relief images, printing plates, photoresists, alloxazine compounds | BASF AKTIENGESELLSCHAFT (DE) | 1992-05-12 | — | — | US | disclosed |
| US-4985343-A | Crosslinking-curable resin composition | MITSUBISHI RAYON CO., LTD. (JP) | 1991-01-15 | — | — | US | disclosed |
| US-4962011-A | Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers and lithographic printing plates based thereon | BASF AKTIENGESELLSCHAFT (DE) | 1990-10-09 | — | — | US | disclosed |
| EP-0382524-A2 | Crosslinking-curable resin composition | MITSUBISHI RAYON CO., LTD. (JP) | 1990-08-16 | — | — | EP | disclosed |
| US-4940649-A | Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon | BASF AKTIENGESELLSCHAFT (DE) | 1990-07-10 | — | — | US | disclosed |
| US-4908448-A | 4-Quinazolone compounds | BASF AKTIENGESELLSCHAFT (DE) | 1990-03-13 | — | — | US | disclosed |
| US-4891301-A | AS SENSITIZERS | BASF AKTIENGESELLSCHAFT (DE) | 1990-01-02 | — | — | US | disclosed |