Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AKR1B10 | O60218 | 7/20 | 0.68 |
| ▸ | AKR1B1 | P15121 | 7/20 | 0.68 |
| ▸ | LMNA | P02545 | 2/20 | 0.58 |
| ▸ | MAOB | P27338 | 1/20 | 0.57 |
| ▸ | APP | P05067 | 2/20 | 0.57 |
| ▸ | MEN1 | O00255 | 3/20 | 0.55 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.53 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.50 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.50 |
| ▸ | CA12 | O43570 | 2/20 | 0.50 |
| ▸ | CA4 | P22748 | 2/20 | 0.50 |
| ▸ | CA6 | P23280 | 2/20 | 0.50 |
| ▸ | CA5A | P35218 | 2/20 | 0.50 |
| ▸ | CA7 | P43166 | 2/20 | 0.50 |
| ▸ | CA9 | Q16790 | 2/20 | 0.50 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL925590 | 1.00 | AKR1B10 (0.68) | AKR1B10AKR1B1LMNAMAOBAPP | |
| SCHEMBL9271059 | 0.90 | AKR1B10 (0.55) | AKR1B10AKR1B1LMNAMAOBAPP | |
| SCHEMBL16234738 | 0.88 | AKR1B10 (0.83) | AKR1B10AKR1B1LMNAMAOBAPP | |
| SCHEMBL19279512 | 0.88 | AKR1B10 (0.83) | AKR1B10AKR1B1LMNAMAOBAPP | |
| SCHEMBL9277968 | 0.88 | AKR1B10 (0.83) | AKR1B10AKR1B1LMNAMAOBAPP | |
| SCHEMBL843436 | 0.87 | AKR1B10 (0.71) | AKR1B10AKR1B1LMNAMAOBAPP | |
| SCHEMBL843435 | 0.87 | AKR1B10 (0.71) | AKR1B10AKR1B1LMNAMAOBAPP | |
| Propene SCHEMBL13387681 | 0.85 | AKR1B10 (0.64) | AKR1B10AKR1B1LMNAMAOBAPP | |
| SCHEMBL3679949 | 0.84 | AKR1B10 (0.71) | AKR1B10AKR1B1LMNAMAOBAPP | |
| SCHEMBL3679950 | 0.84 | AKR1B10 (0.71) | AKR1B10AKR1B1LMNAMAOBAPP |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0179921-B1 | BASE MATERIAL HAVING A DYED SURFACE FILM AND DYEING METHOD | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 1990-08-08 | — | — | EP | claimed |
| US-4675252-A | Base material having a dyed membrane on the surface thereof, and method for dyeing a membrane thereon | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 1987-06-23 | — | — | US | claimed |
| EP-0179921-A1 | BASE MATERIAL HAVING A DYED SURFACE FILM AND DYEING METHOD | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 1986-05-07 | — | — | EP | claimed |
| JP-59216139-A | — | — | None | — | — | JP | disclosed |
| JP-61083530-A | — | — | None | — | — | JP | disclosed |
| JP-56110932-A | — | — | None | — | — | JP | disclosed |
| WO-2021259092-A1 | PHOTORESIST COMPOSITION AND METHOD FOR FORMING THIN FILM PATTERN AND ARRAY SUBSTRATE BY USING SAME | 无锡华睿芯材科技有限公司 | 2021-12-30 | — | — | WO | disclosed |
| US-8399583-B2 | Polymer, curable resin composition, cured product, and article | NIPPON SHOKUBAI CO., LTD. (JP) | 2013-03-19 | — | — | US | disclosed |
| US-20110009586-A1 | POLYMER, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND ARTICLE | NIPPON SHOKUBAI CO., LTD. (JP) | 2011-01-13 | — | — | US | disclosed |
| US-7763686-B2 | Having a narrow molecular weight distribution in a short amount of time and with good productivity by mixing a first Lewis acid with a proton source to generate initiator cations, and adding a vinyl ether and a second Lewis acid to initiate a high-speed polymerization | CANON KABUSHIKI KAISHA (JP) | 2010-07-27 | — | — | US | disclosed |
| US-20070060687-A1 | Resin compositions | KYOWA HAKKO CHEMICAL CO., LTD. (JP) | 2007-03-15 | — | — | US | disclosed |
| JP-S6183530-A | PHOTOSENSITIVE RESIN COMPOSITION | DAINIPPON INK & CHEM INC | 1986-04-28 | — | — | JP | disclosed |
| JP-S59216139-A | SELF-SENSITIZING PHOTOSENSITIVE RESIN | RES DEV CORP OF JAPAN | 1984-12-06 | — | — | JP | disclosed |
| US-4455364-A | ETCHING RESISTANCE | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1984-06-19 | — | — | US | disclosed |
| EP-0082588-A2 | Photolithographic elements for the production of metal images | KONICA CORPORATION (JP) | 1983-06-29 | — | — | EP | disclosed |
| JP-S56110932-A | COMPOUND FOR NEGATIVE TYPE RESIST | NIPPON TELEGR & TELEPH CORP <NTT> | 1981-09-02 | — | — | JP | disclosed |
| US-4083725-A | CINNAMIC ACID PHOTOSENSITIVE RESIN AND A HALOGEN SUBSTITUTED BENZANTHRONE SENSITIZER | MITSUBISHI CHEMICAL INDUSTRIES LTD. (JA) | 1978-04-11 | — | — | US | disclosed |
| US-4063953-A | POLYETHERS, POLYEPICHLOROHYDRIN, VINYL CINNAMATES | MITSUBISHI CHEMICAL INDUSTRIES, LTD. (JA) | 1977-12-20 | — | — | US | disclosed |
| US-4041017-A | Reactive light-sensitive high polymer compound containing furyl pentadienic ester groups and insolubilized by action of heat, light or electron beams | FUJI PHOTO FILM CO., LTD. (JA) | 1977-08-09 | — | — | US | disclosed |
| US-3931248-A | Reactive high polymer compound | FUJI PHOTO FILM CO., LTD. (JA) | 1976-01-06 | — | — | US | disclosed |