SCHEMBL9256767

SCHEMBL9256767

C1CCC(CC2CCC34OC3(C2)O4)CC1.CC1(C)CC23OC2(CC1(CC1CCCCC1)C(=O)O)O3

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15555 0.88 SLC1A3 (0.32)
Bicarbonate SCHEMBL7187882 0.81 SLC1A3 (0.31)
SCHEMBL284376 0.76 ATP1A1 (0.30)
Formic Acid SCHEMBL2248027 0.74 ATP1A1 (0.32)
SCHEMBL8401956 0.70 GRM2 (0.30)
Bicarbonate SCHEMBL3257317 0.68
SCHEMBL25307196 0.68 SLC1A3 (0.35)
SCHEMBL15437 0.67 CYP2C19 (0.33)
SCHEMBL467512 0.67 SLC1A3 (0.31)
SCHEMBL1302443 0.67 GRM2 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5476748-A Containing liquid epoxy resin, acrylated ester, photointiator and hydroxyl terminated polyethers, polyesters, or polyurethanes CIBA-GEIGY CORPORATION (US) 1995-12-19 US disclosed