SCHEMBL926316

SCHEMBL926316

CCN(OCCCCCO)OCCCCCO

nearest known ligand 0.42

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
ALDH1A1 P00352 2/20 0.42
TSHR P16473 2/20 0.42
HSD17B10 Q99714 1/20 0.42
SMN1; SMN2 Q16637 2/20 0.38
THRB P10828 1/20 0.37
HTT P42858 1/20 0.37
MAPT P10636 1/20 0.37
ACHE P22303 6/20 0.36
CYP4F2 P78329 2/20 0.34
CYP4A11 Q02928 2/20 0.34
KDM4E B2RXH2 1/20 0.31
GAA P10253 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL928050 1.00 LMNA (0.42) LMNAMEN1KMT2AALDH1A1TSHR
SCHEMBL927186 0.98 SMN1; SMN2 (0.39) LMNAMEN1KMT2AALDH1A1TSHR
SCHEMBL232828 0.90 ALDH1A1 (0.36) LMNAMEN1KMT2AALDH1A1TSHR
SCHEMBL926386 0.82 LMNA (0.44) LMNAMEN1KMT2AALDH1A1TSHR
SCHEMBL927971 0.82 LMNA (0.44) LMNAMEN1KMT2AALDH1A1TSHR
SCHEMBL1548800 0.80 LMNA (0.48) LMNAMEN1KMT2AALDH1A1TSHR
SCHEMBL35604 0.79 ALDH1A1 (0.41) MEN1KMT2AALDH1A1TSHRTHRB
SCHEMBL925939 0.79 SMN1; SMN2 (0.42) LMNAMEN1KMT2AALDH1A1TSHR
SCHEMBL9807817 0.79 LMNA (0.52) LMNAMEN1KMT2AALDH1A1TSHR
SCHEMBL5072157 0.79 LMNA (0.52) LMNAMEN1KMT2AALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080066644-A1 Alkylmines, alkanolamine compounds, surfactants, a coloring agent and a solvent; combination results in decreased kogation SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-03-20 US claimed
EP-1900785-A1 Ink Composition for Inkjet Recording Samsung Electronics Co., Ltd. (KR) 2008-03-19 EP claimed
US-20150361272-A1 RUST PREVENTIVE OIL COMPOSITION JX NIPPON OIL & ENERGY CORPORATION (JP) 2015-12-17 US disclosed
US-9212426-B2 Rust preventive oil composition JX NIPPON OIL & ENERGY CORPORATION (JP) 2015-12-15 US disclosed
US-20150344739-A1 AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, AND CHEMICAL MECHANICAL POLISHING METHOD JSR CORPORATION (JP) 2015-12-03 US disclosed
US-9080123-B2 Rust preventive oil composition JX NIPPON OIL & ENERGY CORPORATION (JP) 2015-07-14 US disclosed
US-20150096463-A1 RUST PREVENTIVE OIL COMPOSITION JX NIPPON OIL & ENERGY CORPORATION (JP) 2015-04-09 US disclosed
US-8481652-B2 Thermoplastic polyamides having polyether amines BASF SE (DE) 2013-07-09 US disclosed
US-8404900-B2 Absorbents for separating acidic gases KOREA ELECTRIC POWER CORPORATION (KR) 2013-03-26 US disclosed
EP-1394289-B1 RUST-PREVENTIVE OIL COMPOSITION NIPPON OIL CORP (JP) 2012-05-09 EP disclosed
US-20110101280-A1 RUST PREVENTIVE OIL COMPOSITION JX NIPPON OIL & ENERGY CORPORATION (JP) 2011-05-05 US disclosed
EP-2314736-A1 RUST-PREVENTIVE OIL COMPOSITION JX Nippon Oil & Energy Corporation (JP) 2011-04-27 EP disclosed
US-20110021686-A1 POLYAMIDE NANOCOMPOSITES WITH HYPER-BRANCHED POLYETHERAMINES BASF SE (DE) 2011-01-27 US disclosed
US-20110021687-A1 POLYAMIDE NANOCOMPOSITES WITH HYPER-BRANCHED POLYETHYLENEIMINES BASF SE (DE) 2011-01-27 US disclosed
US-20110009566-A1 THERMOPLASTIC POLYAMIDES HAVING POLYETHER AMINES BASF SE (DE) 2011-01-13 US disclosed
US-20100105551-A1 ABSORBENTS FOR SEPARATING ACIDIC GASES KOREA ELECTRIC POWER CORPORATION (KR) 2010-04-29 US disclosed
US-20080066644-A1 Alkylmines, alkanolamine compounds, surfactants, a coloring agent and a solvent; combination results in decreased kogation SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-03-20 US disclosed
EP-1900785-A1 Ink Composition for Inkjet Recording Samsung Electronics Co., Ltd. (KR) 2008-03-19 EP disclosed
EP-1394289-A1 RUST-PREVENTIVE OIL COMPOSITION Nippon Mitsubishi Oil Corporation (JP) 2004-03-03 EP disclosed