Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRMT1 | Q99873 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | PABPC1 | P11940 | 1/20 | 0.31 |
| ▸ | XBP1 | P17861 | 1/20 | 0.31 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | SMARCA2 | P51531 | 1/20 | 0.31 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | RELA | Q04206 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL923834 | 0.87 | PPARG (0.33) | MAPTKMT2A | |
| Indene SCHEMBL924870 | 0.81 | — | — | |
| SCHEMBL14827269 | 0.77 | PRMT1 (0.31) | PRMT1KDM4EALDH1A1LMNAPOLB | |
| SCHEMBL8765431 | 0.76 | KMT2A (0.46) | PRMT1KDM4EALDH1A1LMNAPOLB | |
| 4-Vinylphenol SCHEMBL925066 | 0.75 | — | — | |
| SCHEMBL26938846 | 0.74 | LMNA (0.32) | LMNA | |
| SCHEMBL26938832 | 0.68 | CYP2A6 (0.39) | KDM4EALDH1A1LMNAPOLBMAPT | |
| SCHEMBL26938847 | 0.68 | KCNH2 (0.35) | KDM4EALDH1A1 | |
| SCHEMBL12216185 | 0.67 | TSHR (0.38) | KDM4EHTT | |
| SCHEMBL926733 | 0.66 | SLC22A6 (0.42) | KDM4EALDH1A1POLBMAPTHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2270596-B1 | Positive resist compostion and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2018-07-25 | — | — | EP | disclosed |
| US-8389201-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-05 | — | — | US | disclosed |
| US-20110003251-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-06 | — | — | US | disclosed |
| EP-2270596-A2 | Positive resist compostion and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-01-05 | — | — | EP | disclosed |