SCHEMBL9282004

SCHEMBL9282004

O=c1c2ccccc2oc2cccc(F)c12

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 9/20 0.63
HPGD P15428 2/20 0.63
SMN1; SMN2 Q16637 2/20 0.63
KDM4E B2RXH2 1/20 0.63
ALDH1A1 P00352 1/20 0.63
GLA P06280 1/20 0.63
CYP3A4 P08684 1/20 0.63
MAPT P10636 1/20 0.63
PGAM1 P18669 1/20 0.63
CASP1 P29466 1/20 0.63
CASP7 P55210 1/20 0.63
HSD17B10 Q99714 1/20 0.63
NMUR2 Q9GZQ4 1/20 0.54
MGAM O43451 1/20 0.51
GAA P10253 1/20 0.51
SI P14410 1/20 0.51
MGAM2 Q2M2H8 1/20 0.51
KDM5A P29375 1/20 0.50
AR P10275 1/20 0.47
NPC1 O15118 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL30589868 0.90 MAOA (0.57) MAOAHPGDSMN1; SMN2KDM4EALDH1A1
SCHEMBL20346638 0.87 MAOA (0.53) MAOAHPGDSMN1; SMN2KDM4EALDH1A1
SCHEMBL20346643 0.86 MAOA (0.56) MAOAHPGDSMN1; SMN2KDM4EALDH1A1
SCHEMBL7110353 0.84 HPGD (0.48) MAOAHPGDSMN1; SMN2KDM4EALDH1A1
Fluoride SCHEMBL28991354 0.82 HPGD (0.46) MAOAHPGDSMN1; SMN2KDM4EALDH1A1
SCHEMBL22128470 0.81 MAOA (0.59) MAOAHPGDSMN1; SMN2KDM4EALDH1A1
SCHEMBL20346608 0.81 AHR (0.57) MAOAHPGDSMN1; SMN2KDM4EALDH1A1
SCHEMBL20317224 0.81 AR (0.45) MAOAHPGDSMN1; SMN2KDM4EALDH1A1
SCHEMBL9836863 0.80 MAOA (0.64) MAOAHPGDSMN1; SMN2KDM4EALDH1A1
SCHEMBL5782106 0.79 MAOA (0.64) MAOAHPGDSMN1; SMN2KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117420731-A Negative photosensitive composition and pattern forming method 东京应化工业株式会社 2024-01-19 CN disclosed
CN-116018558-A Negative photosensitive resin composition, pattern forming method and laminated film 三亚普罗股份有限公司 2023-04-25 CN disclosed
US-9811010-B2 Electrophotographic photosensitive member, process cartridge, and image forming apparatus FUJI XEROX CO., LTD. (JP) 2017-11-07 US disclosed
US-20170052464-A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND IMAGE FORMING APPARATUS FUJI XEROX CO., LTD. (JP) 2017-02-23 US disclosed
US-5434264-A α,α-disubstituted aromatics and heteroaromatics as cognition enhancers THE DU PONT MERCK PHARMACEUTICAL COMPANY (US) 1995-07-18 US disclosed
US-5300642-A α, α-disubstituted aromatics and heteroaromatics as cognition enhancers THE DU PONT MERCK PHARMACEUTICAL COMPANY (US) 1994-04-05 US disclosed
EP-0311010-B1 Alpha,Alpha-disubstituted aromatics and heteroaromatics as cognition enhancers DU PONT MERCK PHARMA (US) 1994-02-02 EP disclosed
EP-0532054-A1 Process for preparing alpha,alpha-disubstituted aromatics and heteroaromatics as cognition enhancers THE DU PONT MERCK PHARMACEUTICAL COMPANY (US) 1993-03-17 EP disclosed
US-5173489-A α,α-disubstituted aromatics and heteroaromatics as cognition enhancers THE DUPONT MERCK PHARMACEUTICAL CO. (US) 1992-12-22 US disclosed
EP-0311010-A2 Alpha,Alpha-disubstituted aromatics and heteroaromatics as cognition enhancers THE DU PONT MERCK PHARMACEUTICAL COMPANY (US) 1989-04-12 EP disclosed