SCHEMBL928215

SCHEMBL928215

Cc1cccc(C(S)S)c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 4/20 0.52
ACP3 P15309 1/20 0.46
ALDH1A1 P00352 2/20 0.42
MAPK1 P28482 1/20 0.42
AOC3 Q16853 1/20 0.42
CYP19A1 P11511 3/20 0.41
TAAR1 Q96RJ0 2/20 0.40
TP53 P04637 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
GAA P10253 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
NPC1 O15118 1/20 0.37
CASP3 P42574 1/20 0.37
SENP8 Q96LD8 1/20 0.37
SENP7 Q9BQF6 1/20 0.37
SENP6 Q9GZR1 1/20 0.37
CYP1A2 P05177 1/20 0.37
CYP3A4 P08684 1/20 0.37
CYP2D6 P10635 1/20 0.37
MAPT P10636 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17106872 0.81 PGK1 (0.39) ALDH1A1TP53TDP1CYP3A4MAPT
SCHEMBL28543575 0.79 ACP3 (0.50) ACHEACP3ALDH1A1MAPK1AOC3
SCHEMBL8784945 0.79 ACHE (0.58) ACHEACP3ALDH1A1MAPK1AOC3
SCHEMBL5490186 0.77 ACHE (0.55) ACHEACP3ALDH1A1MAPK1AOC3
SCHEMBL29352930 0.77 ACHE (0.55) ACHEACP3ALDH1A1MAPK1AOC3
SCHEMBL931982 0.77 ACHE (0.55) ACHEACP3ALDH1A1MAPK1AOC3
SCHEMBL10797679 0.77 ACHE (0.55) ACHEACP3ALDH1A1MAPK1AOC3
SCHEMBL99347 0.77 ACHE (0.55) ACHEACP3ALDH1A1MAPK1AOC3
SCHEMBL29378635 0.77 ACHE (0.55) ACHEACP3ALDH1A1MAPK1AOC3
SCHEMBL3254719 0.75 ACHE (0.52) ACHEACP3ALDH1A1MAPK1AOC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 231 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-7215964-A None JP disclosed
WO-2023100828-A1 CURABLE COMPOSITION AND CURED PRODUCT THEREOF ENEOS株式会社 2023-06-08 WO disclosed
US-11028262-B2 Resin composition, anisotropic conductive film including the same, and electronic device PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2021-06-08 US disclosed
WO-2021070520-A1 COMPOSITION, METHOD FOR PRODUCING COMPOSITION, CURED FILM, TRANSFER FILM AND METHOD FOR MANUFACTURING TOUCH PANEL 富士フイルム株式会社 2021-04-15 WO disclosed
WO-2020066405-A1 STACKED BODY, STACKED BODY MANUFACTURING METHOD, AND CAPACITIVE INPUT DEVICE 富士フイルム株式会社 2020-04-02 WO disclosed
US-20190284388-A1 RESIN COMPOSITION, ANISOTROPIC CONDUCTIVE FILM INCLUDING THE SAME, AND ELECTRONIC DEVICE PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2019-09-19 US disclosed
EP-1859954-B2 Planographic printing plate precursor and stack thereof FUJIFILM CORP (JP) 2017-11-08 EP disclosed
EP-2006738-B1 Lithographic printing plate precursor FUJIFILM CORP (JP) 2017-09-06 EP disclosed
EP-1975707-B1 Curable composition and planographic printing plate precursor FUJIFILM CORP (JP) 2017-07-19 EP disclosed
US-9651771-B2 Manufacturing method for an electrowetting device AMAZON TECHNOLOGIES, INC. (US) 2017-05-16 US disclosed
US-6322950-B1 Photosensitive composition and 1,3-dihydro-1-oxo-2H-indene derivative FUJI PHOTO FILM CO., LTD. (JP) 2001-11-27 US disclosed
US-6313316-B1 2,5-BIS(ISOCYANATOALKYLTHIOALKYL)-1,4-DITHIAN DERIVATIVES; HIGH REFRACTIVE INDEX; HEAT RESISTANCE, RADIATION TRANSPARENT; OPTICAL FILTERS AND FIBERS; EYEGLASSES HOYA CORPORATION (JP) 2001-11-06 US disclosed
EP-1070990-A1 Photosensitive composition and method of making lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2001-01-24 EP disclosed
US-6140384-A VERY SENSITIVE TO VISIBLE LIGHT RAYS GOOD SENSITIVITY TO ARGON AND YAG-SHG LASER LIGHT; COMPRISING AN ADDITION POLYMERIZABLE COMPOUND, A CYANO- OR CARBONYL-CONTAINING MEROCYANINE SENSITIZING DYE AND A TITANOCENE; PRINTED CIRCUIT FUJI PHOTO FILM CO., LTD. (JP) 2000-10-31 US disclosed
EP-1035435-A2 Photosensitive composition and 1,3-dihydro-1-oxo-2H-indene derivative FUJI PHOTO FILM CO., LTD. (JP) 2000-09-13 EP disclosed
EP-0985683-A1 Photosensitive composition and method for manufacturing lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2000-03-15 EP disclosed
JP-H07215964-A THIOACETAL COMPOUND, MONOMER COMPOSITION AND MATERIAL FOR OPTICAL ARTICLE NIPPON OIL & FATS CO LTD 1995-08-15 JP disclosed
EP-0565891-A1 Copolymer latex, production and use thereof TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1993-10-20 EP disclosed
US-4766201-A Hydroxy alkyl amide thio ether composition from bis-bicyclic amide acetal and polythiol ASHLAND OIL INC. (US) 1988-08-23 US disclosed
US-4665229-A Preparation of hydroxy alkyl amide thio ether compounds from bicyclic amide acetal and thiol ASHLAND OIL, INC. (US) 1987-05-12 US disclosed