Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CNR2 | P34972 | 4/20 | 0.34 |
| ▸ | CA1 | P00915 | 3/20 | 0.33 |
| ▸ | CA2 | P00918 | 3/20 | 0.33 |
| ▸ | CA9 | Q16790 | 3/20 | 0.33 |
| ▸ | CNR1 | P21554 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | GPR183 | P32249 | 1/20 | 0.33 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.31 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.31 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.31 |
| ▸ | HTR1A | P08908 | 1/20 | 0.31 |
| ▸ | HTR1D | P28221 | 1/20 | 0.31 |
| ▸ | HTR1B | P28222 | 1/20 | 0.31 |
| ▸ | KIF11 | P52732 | 1/20 | 0.30 |
| ▸ | CXCR2 | P25025 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2057931 | 0.87 | CA1 (0.32) | CNR2CA1CA2CA9CNR1 | |
| SCHEMBL2058161 | 0.84 | CA1 (0.32) | CA1CA2CA9 | |
| SCHEMBL576305 | 0.83 | CA2 (0.44) | CA1CA2CA9KMT2APTPN1 | |
| SCHEMBL926879 | 0.83 | ELANE (0.40) | CNR2CNR1KMT2AMEN1GPR183 | |
| SCHEMBL927419 | 0.79 | ALDH1A1 (0.33) | CNR2CA1CA2CA9CNR1 | |
| SCHEMBL2057811 | 0.78 | ALPI (0.43) | CA1CA2CA9ALDH1A1GAA | |
| SCHEMBL17355691 | 0.76 | HTR2A (0.35) | CNR2KMT2AALDH1A1SLC6A4 | |
| SCHEMBL9957392 | 0.76 | STS (0.57) | CA1CA2ALDH1A1KDM4EHTR1D | |
| SCHEMBL17356440 | 0.76 | CNR2 (0.39) | CNR2CA1CA2CA9CNR1 | |
| SCHEMBL14872862 | 0.75 | CA2 (0.50) | CA1CA2CA9KMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9065146-B2 | Nonaqueous electrolyte and lithium secondary battery employing the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2015-06-23 | — | — | US | disclosed |
| US-8551662-B2 | Nonaqueous electrolyte and lithium secondary battery employing the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2013-10-08 | — | — | US | disclosed |
| EP-1942375-B1 | Inkjet printer head comprising photosensitive polymer complex containing silver nanoparticles and method of preparing the photosensitive polymer complex | SAMSUNG ELECTRONICS CO LTD (KR) | 2013-02-27 | — | — | EP | disclosed |
| US-8383317-B2 | Surface treatment of interpenetrating polymer networkcarbon tubes; photolithography; modifying surfaces of carbon nanotubes with polymerizable functional groups such as oxirane and anhydride groups; heat curing; negative patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-02-26 | — | — | US | disclosed |
| US-8211957-B2 | Negative pattern of carbon nanotubes and carbon nanotube composite comprising surface-modified carbon nanotubes | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-07-03 | — | — | US | disclosed |
| US-8029935-B2 | Nonaqueous electrolyte and lithium secondary battery employing the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2011-10-04 | — | — | US | disclosed |
| US-20110229771-A1 | NONAQUEOUS ELECTROLYTE AND LITHIUM SECONDARY BATTERY EMPLOYING THE SAME | MITSUBISHI CHEMICAL CORPORATION (JP) | 2011-09-22 | — | — | US | disclosed |
| US-7981553-B2 | Nonaqueous electrolyte and lithium secondary battery employing the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2011-07-19 | — | — | US | disclosed |
| US-20110159380-A1 | NONAQUEOUS ELECTROLYTE AND LITHIUM SECONDARY BATTERY EMPLOYING THE SAME | MITSUBISHI CHEMICAL CORPORATION (JP) | 2011-06-30 | — | — | US | disclosed |
| US-7923110-B2 | Metal nanoparticle having a self-assembled monolayer on its surface, and formation of conductive pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-04-12 | — | — | US | disclosed |
| US-20050127355-A1 | Composition for forming organic insulating film and organic insulating film formed from the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-06-16 | — | — | US | disclosed |
| EP-1542241-A1 | Composition for forming organic insulating film and organic insulating film formed from the same | Samsung Electronics Co., Ltd (KR) | 2005-06-15 | — | — | EP | disclosed |
| US-20050118512-A1 | Nonaqueous electrolyte and lithium secondary battery employing the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2005-06-02 | — | — | US | disclosed |
| US-20040265755-A1 | Surface treatment of interpenetrating polymer networkcarbon tubes; photolithography; heat curing; negative patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-12-30 | — | — | US | disclosed |
| EP-1457821-A1 | Method of making carbon nanotube patterned film or carbon nanotube composite material using a composition comprising carbon nanotubes surface-modified with polymerizable moieties | Samsung Electronics Co., Ltd. (KR) | 2004-09-15 | — | — | EP | disclosed |
| US-20020015906-A1 | Polymer for photoresist, method of production thereof and photoresist composition containing polymer | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-02-07 | — | — | US | disclosed |
| EP-0704762-B1 | Resist material and pattern formation | WAKO PURE CHEM IND LTD (JP) | 1999-12-15 | — | — | EP | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |