SCHEMBL929339

SCHEMBL929339

CCCO[SiH](CCCCCC[SiH](OCCC)OCCC)OCCC

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.30
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6706823 1.00 TSHR (0.30) TSHRTHRB
SCHEMBL6708448 1.00 TSHR (0.30) TSHRTHRB
SCHEMBL1123036 1.00 TSHR (0.30) TSHRTHRB
SCHEMBL6708436 1.00 TSHR (0.30) TSHRTHRB
SCHEMBL706691 0.97
SCHEMBL3149894 0.95 THRB (0.40) TSHRTHRB
SCHEMBL5574604 0.95 THRB (0.40) TSHRTHRB
SCHEMBL6298295 0.95 THRB (0.40) TSHRTHRB
SCHEMBL8092136 0.95 THRB (0.40) TSHRTHRB
SCHEMBL6298936 0.95 THRB (0.40) TSHRTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8603588-B2 Composition and method for production thereof, porous material and method for production thereof, interlayer insulating film, semiconductor material, semiconductor device, and low-refractive-index surface protection film MITSUI CHEMICALS, INC. (JP) 2013-12-10 US disclosed
US-8304924-B2 Composition for sealing semiconductor, semiconductor device, and process for producing semiconductor device MITSUI CHEMICALS, INC. (JP) 2012-11-06 US disclosed
US-20110241210-A1 COMPOSITION FOR SEALING SEMICONDUCTOR, SEMICONDUCTOR DEVICE, AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE MITSUI CHEMICALS, INC. (JP) 2011-10-06 US disclosed
EP-2357664-A1 COMPOSITION FOR SEALING SEMICONDUCTOR, SEMICONDUCTOR DEVICE, AND PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE Mitsui Chemicals, Inc. (JP) 2011-08-17 EP disclosed
EP-1619692-B1 PROTON-CONDUCTIVE FILM, PROCESS FOR PRODUCING THE SAME, AND FUEL CELL EMPOLYING THE PROTON-CONDUCTIVE FILM SEKISUI CHEMICAL CO LTD (JP) 2011-02-09 EP disclosed
US-20110018108-A1 COMPOSITION AND METHOD FOR PRODUCTON THEREOF, POROUS MATERIAL AND METHOD FOR PRODUCTION THEREOF, INTERLAYER INSULATING FILM, SEMICONDUCTOR MATERIAL, SEMICONDUCTOR DEVICE, AND LOW-REFRACTIVE-INDEX SURFACE PROTECTION FILM MITSUI CHEMICALS ,INC. (JP) 2011-01-27 US disclosed
EP-2267080-A1 COMPOSITION AND METHOD FOR PRODUCTION THEREOF, POROUS MATERIAL AND METHOD FOR PRODUCTION THEREOF, INTERLAYER INSULATING FILM, SEMICONDUCTOR MATERIAL, SEMICONDUCTOR DEVICE, AND LOW-REFRACTIVE-INDEX SURFACE PROTECTION FILM Mitsui Chemicals, Inc. (JP) 2010-12-29 EP disclosed
US-20100233482-A1 Organic silicon oxide fine particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device HAMADA YOSHITAKA 2010-09-16 US disclosed
US-7754330-B2 Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-07-13 US disclosed
US-20090294922-A1 ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE PANASONIC CORPORATION (JP) 2009-12-03 US disclosed
US-20090294726-A1 ORGANIC SILICON OXIDE FINE PARTICLES AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-12-03 US disclosed
US-20060219981-A1 Proton conductive film, process for producing the same, and fuel cell employing the proton-conductive film SEKISUI CHEMICAL CO., LTD. (JP) 2006-10-05 US disclosed
EP-1619692-A1 PROTON-CONDUCTIVE FILM, PROCESS FOR PRODUCING THE SAME, AND FUEL CELL EMPOLYING THE PROTON-CONDUCTIVE FILM SEKISUI CHEMICAL CO., LTD. (JP) 2006-01-25 EP disclosed
US-20040028978-A1 Proton conducting membrane, method for producing the same, and fuel cell using the same NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2004-02-12 US disclosed
EP-1334993-A2 Proton conducting membrane, method for producing the same, and fuel cell using the same National Institute of Advanced Industrial Science and Technology (JP) 2003-08-13 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090294922-A1 ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE SPOP, OSTC, SEM1 TSHR 4371/4885THRB 4691/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.