SCHEMBL9300191

SCHEMBL9300191

CC(CC(=O)O)OC(=O)CBr

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.43
FAAH O00519 3/20 0.39
CNR1 P21554 1/20 0.39
CNR2 P34972 1/20 0.39
TRPA1 O75762 1/20 0.38
ALDH1A1 P00352 1/20 0.38
MMP1 P03956 1/20 0.35
MMP2 P08253 1/20 0.35
MMP3 P08254 1/20 0.35
MMP9 P14780 1/20 0.35
MMP13 P45452 1/20 0.35
ALOX15 P16050 1/20 0.34
SLC22A6 Q4U2R8 1/20 0.33
CYP2C19 P33261 1/20 0.33
CACNA2D1 P54289 2/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
LMNA P02545 1/20 0.32
CACNB3 P54284 1/20 0.32
CACNA1C Q13936 1/20 0.32
PGR P06401 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29124665 0.82 CYP1A2 (0.40) TSHRMMP1MMP2MMP3MMP9
SCHEMBL25946807 0.81 TSHR (0.42) TSHRFAAHCNR1CNR2TRPA1
SCHEMBL13576868 0.80 MMP1 (0.55) ALDH1A1MMP1MMP2MMP3MMP9
SCHEMBL4361342 0.80 MMP1 (0.36) TSHRMMP1MMP2MMP3MMP9
SCHEMBL2738372 0.80 FFAR3 (0.39) TSHRMMP1MMP2MMP3MMP9
SCHEMBL34471150 0.78 MMP1 (0.39) TSHRMMP1MMP2MMP3MMP9
SCHEMBL1125336 0.78 MMP1 (0.39) TSHRMMP1MMP2MMP3MMP9
SCHEMBL2526939 0.78 CYP1A2 (0.49) TSHRALDH1A1LMNACYP1A2
SCHEMBL30096975 0.78 MMP1 (0.39) TSHRMMP1MMP2MMP3MMP9
SCHEMBL2510667 0.78 MMP1 (0.39) TSHRMMP1MMP2MMP3MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed
US-5286842-A Process for producing a biodegradable polymer MITSUBISHI KASEI CORPORATION (JP) 1994-02-15 US disclosed
EP-0522422-A2 Process for producing a biodegradable polymer Mitsubishi Chemical Corporation (JP) 1993-01-13 EP disclosed