SCHEMBL9305545

SCHEMBL9305545

CC(C)(C)c1ccc(O)c(Cc2cc(C(c3ccccc3)c3cc(Cc4cc(C(C)(C)C)ccc4O)c(O)c(Cc4cc(C(C)(C)C)ccc4O)c3)cc(Cc3cc(C(C)(C)C)ccc3O)c2O)c1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 5/20 0.51
TSHR P16473 2/20 0.44
AMY1A P0DUB6 1/20 0.42
CYP2C19 P33261 6/20 0.40
CYP3A4 P08684 4/20 0.40
CYP1A2 P05177 3/20 0.40
CYP2C9 P11712 3/20 0.40
ALDH1A1 P00352 3/20 0.40
HSD17B10 Q99714 3/20 0.40
HPGD P15428 2/20 0.40
ALOX15 P16050 2/20 0.40
TDP1 Q9NUW8 1/20 0.40
CACNA1B Q00975 1/20 0.40
MEN1 O00255 3/20 0.40
KMT2A Q03164 3/20 0.40
ESR1 P03372 3/20 0.40
MAPT P10636 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
USP2 O75604 1/20 0.40
TP53 P04637 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9307036 0.85 CYP2D6 (0.47) CYP2D6TSHRAMY1ACYP2C19CYP3A4
SCHEMBL3810884 0.82 CYP2D6 (0.59) CYP2D6TSHRAMY1ACYP2C19CYP3A4
SCHEMBL1345214 0.82 CYP2D6 (0.59) CYP2D6TSHRAMY1ACYP2C19CYP3A4
SCHEMBL1345705 0.82 CYP2D6 (0.59) CYP2D6TSHRAMY1ACYP2C19CYP3A4
SCHEMBL3819212 0.82 CYP2D6 (0.59) CYP2D6TSHRAMY1ACYP2C19CYP3A4
SCHEMBL1345527 0.82 CYP2D6 (0.59) CYP2D6TSHRAMY1ACYP2C19CYP3A4
SCHEMBL3821963 0.82 CYP2D6 (0.59) CYP2D6TSHRAMY1ACYP2C19CYP3A4
SCHEMBL1343857 0.82 CYP2D6 (0.59) CYP2D6TSHRAMY1ACYP2C19CYP3A4
SCHEMBL9307031 0.82 CYP2D6 (0.55) CYP2D6TSHRAMY1ACYP2C19CYP3A4
SCHEMBL9305110 0.82 AMY1A (0.66) AMY1ACYP2C19CYP3A4CYP2C9HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5376498-A Blend of an alkali-soluble resin, compound that generates an acid upon irradiation, functional aromatic compound and a phenolic compound JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-12-27 US disclosed
EP-0542572-A1 Negative type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-05-19 EP disclosed