SCHEMBL9305110

SCHEMBL9305110

Cc1ccc(O)c(Cc2cc(C(c3ccccc3)c3cc(Cc4cc(C)ccc4O)c(O)c(Cc4cc(C)ccc4O)c3)cc(Cc3cc(C)ccc3O)c2O)c1

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AMY1A P0DUB6 1/20 0.66
HTT P42858 2/20 0.44
HIF1A Q16665 3/20 0.41
CYP2C9 P11712 2/20 0.41
CYP2C19 P33261 2/20 0.41
HPGD P15428 3/20 0.41
LMNA P02545 2/20 0.41
ALOX15 P16050 2/20 0.41
MAPT P10636 2/20 0.40
ESR1 P03372 1/20 0.40
CHRM2 P08172 1/20 0.40
CHRM4 P08173 1/20 0.40
CHRM5 P08912 1/20 0.40
CHRM1 P11229 1/20 0.40
KCNE1 P15382 1/20 0.40
CHRM3 P20309 1/20 0.40
PTGS1 P23219 1/20 0.40
HRH2 P25021 1/20 0.40
HTR2A P28223 1/20 0.40
SLC6A4 P31645 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9305978 0.84 AMY1A (0.46) AMY1AHIF1ACYP2C9CYP2C19LMNA
SCHEMBL9305545 0.82 CYP2D6 (0.51) AMY1AHIF1ACYP2C9CYP2C19HPGD
SCHEMBL8345110 0.81 AMY1A (0.55) AMY1AHTTHIF1ACYP2C9CYP2C19
SCHEMBL1345563 0.81 AMY1A (1.00) AMY1AHTTHIF1ACYP2C9CYP2C19
SCHEMBL1345514 0.81 AMY1A (1.00) AMY1AHTTHIF1ACYP2C9CYP2C19
SCHEMBL1345917 0.81 AMY1A (1.00) AMY1AHTTHIF1ACYP2C9CYP2C19
SCHEMBL18352 0.81 AMY1A (1.00) AMY1AHTTHIF1ACYP2C9CYP2C19
SCHEMBL3820165 0.81 AMY1A (1.00) AMY1AHTTHIF1ACYP2C9CYP2C19
SCHEMBL29623092 0.81 AMY1A (1.00) AMY1AHTTHIF1ACYP2C9CYP2C19
SCHEMBL30320292 0.81 AMY1A (1.00) AMY1AHTTHIF1ACYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5376498-A Blend of an alkali-soluble resin, compound that generates an acid upon irradiation, functional aromatic compound and a phenolic compound JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-12-27 US disclosed
EP-0542572-A1 Negative type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-05-19 EP disclosed