SCHEMBL9305864

SCHEMBL9305864

O=C1C=CC(=O)N1CNc1ccccc1

nearest known ligand 0.63

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.56
LMNA P02545 2/20 0.56
TP53 P04637 1/20 0.54
TDP1 Q9NUW8 1/20 0.54
ALDH1A1 P00352 2/20 0.51
MAPK1 P28482 1/20 0.51
GSK3A P49840 3/20 0.50
GSK3B P49841 3/20 0.50
MGLL Q99685 3/20 0.50
RPS6KA2 Q15349 5/20 0.49
GFER P55789 1/20 0.47
CES1 P23141 3/20 0.45
BCHE P06276 1/20 0.45
HSP90AA1 P07900 1/20 0.44
FAAH O00519 1/20 0.44
PTGS1 P23219 1/20 0.44
PTGS2 P35354 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10548866 0.93 HSP90AA1 (0.56) KDM4ELMNATP53TDP1ALDH1A1
SCHEMBL9304609 0.78 RPS6KA2 (0.77) KDM4ELMNATP53TDP1MAPK1
SCHEMBL9303245 0.74 ALOX5 (0.62) ALDH1A1MAPK1RPS6KA2
SCHEMBL17160677 0.72 GSK3A (0.57) KDM4ELMNATP53TDP1ALDH1A1
SCHEMBL7496165 0.72 KDM4E (0.53) KDM4ELMNATP53TDP1ALDH1A1
SCHEMBL17160579 0.71 KDM4E (0.51) KDM4ELMNATP53TDP1ALDH1A1
SCHEMBL17160621 0.70 KMT2A (0.55) KDM4ELMNATP53TDP1ALDH1A1
SCHEMBL9327964 0.69 KMT2A (0.68) KDM4ELMNATP53ALDH1A1
SCHEMBL17160678 0.69 KDM4E (0.45) KDM4ELMNATP53TDP1ALDH1A1
SCHEMBL2785687 0.69 PTGS1 (0.73) LMNATP53ALDH1A1MAPK1GSK3A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0546113-A1 NONLINEAR OPTICAL MATERIALS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1993-06-16 EP claimed
CN-115826360-A Photosensitive polyimide composition, method for producing pattern, cured product, and electronic component 江苏艾森半导体材料股份有限公司 2023-03-21 CN disclosed
CN-110941142-B Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2021-05-25 CN disclosed
CN-110941142-A Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2020-03-31 CN disclosed
CN-106104381-B Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2019-12-13 CN disclosed
CN-106104381-A Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2016-11-09 CN disclosed
US-5312565-A Nonlinear optical materials E. I. DUPONT DE NEMOURS AND COMPANY (US) 1994-05-17 US disclosed
EP-0546113-A1 NONLINEAR OPTICAL MATERIALS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1993-06-16 EP disclosed
WO-1992003417-A2 NONLINEAR OPTICAL MATERIALS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-03-05 WO disclosed