Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 3/20 | 0.56 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.56 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.56 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.46 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.46 |
| ▸ | KIF11 | P52732 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.43 |
| ▸ | KCNA5 | P22460 | 1/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.41 |
| ▸ | ATM | Q13315 | 1/20 | 0.41 |
| ▸ | FDPS | P14324 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.38 |
| ▸ | RECQL | P46063 | 1/20 | 0.38 |
| ▸ | IDO1 | P14902 | 1/20 | 0.38 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.38 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9181553 | 0.77 | ALDH1A1 (0.47) | CYP1A2CYP2C9CYP2C19SLC6A2TAAR1 | |
| SCHEMBL9063882 | 0.76 | CYP1A2 (0.58) | CYP1A2CYP2C9CYP2C19SLC6A2TAAR1 | |
| SCHEMBL5946723 | 0.76 | CYP1A2 (0.58) | CYP1A2CYP2C9CYP2C19SLC6A2TAAR1 | |
| SCHEMBL126749 | 0.76 | CYP2C9 (0.58) | CYP1A2CYP2C9CYP2C19SLC6A2TAAR1 | |
| SCHEMBL11860744 | 0.76 | CYP1A2 (0.58) | CYP1A2CYP2C9CYP2C19SLC6A2TAAR1 | |
| SCHEMBL6835655 | 0.74 | SLC6A2 (0.58) | CYP1A2CYP2C9CYP2C19SLC6A2TAAR1 | |
| SCHEMBL5968241 | 0.74 | CYP1A2 (0.56) | CYP1A2CYP2C9CYP2C19SLC6A2TAAR1 | |
| SCHEMBL2573964 | 0.74 | TAAR1 (0.58) | CYP1A2CYP2C9CYP2C19SLC6A2TAAR1 | |
| SCHEMBL7517713 | 0.74 | KCNN4 (0.38) | CYP1A2CYP2C9CYP2C19TAAR1KIF11 | |
| SCHEMBL1645201 | 0.74 | TSHR (0.43) | CYP1A2CYP2C9CYP2C19TAAR1KIF11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0067066-B2 | Dry-developing resist composition | FUJITSU LTD (JP) | 1994-01-12 | — | — | EP | claimed |
| EP-0067066-B1 | DRY-DEVELOPING RESIST COMPOSITION | FUJITSU LIMITED (JP) | 1985-12-18 | — | — | EP | claimed |
| EP-0067067-B1 | DRY-DEVELOPING NEGATIVE RESIST COMPOSITION | FUJITSU LIMITED (JP) | 1985-09-25 | — | — | EP | claimed |
| US-4481279-A | Dry-developing resist composition | FUJITSU LIMITED (JP) | 1984-11-06 | — | — | US | claimed |
| US-4464455-A | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1984-08-07 | — | — | US | claimed |
| EP-0067066-A2 | Dry-developing resist composition | FUJITSU LIMITED (JP) | 1982-12-15 | — | — | EP | claimed |
| EP-0067067-A2 | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1982-12-15 | — | — | EP | claimed |
| CN-117355373-B | Ethylene oligomerization process | 切弗朗菲利浦化学公司 | 2025-05-16 | — | — | CN | disclosed |
| CN-117355373-A | Ethylene oligomerization process | 切弗朗菲利浦化学公司 | 2024-01-05 | — | — | CN | disclosed |
| EP-0067066-B2 | Dry-developing resist composition | FUJITSU LTD (JP) | 1994-01-12 | — | — | EP | disclosed |
| EP-0067066-B1 | DRY-DEVELOPING RESIST COMPOSITION | FUJITSU LIMITED (JP) | 1985-12-18 | — | — | EP | disclosed |
| EP-0067067-B1 | DRY-DEVELOPING NEGATIVE RESIST COMPOSITION | FUJITSU LIMITED (JP) | 1985-09-25 | — | — | EP | disclosed |
| US-4481279-A | Dry-developing resist composition | FUJITSU LIMITED (JP) | 1984-11-06 | — | — | US | disclosed |
| US-4464455-A | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1984-08-07 | — | — | US | disclosed |
| EP-0067066-A2 | Dry-developing resist composition | FUJITSU LIMITED (JP) | 1982-12-15 | — | — | EP | disclosed |
| EP-0067067-A2 | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1982-12-15 | — | — | EP | disclosed |