SCHEMBL9325850

SCHEMBL9325850

NCC1(CN)C=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15388092 0.86
SCHEMBL4268485 0.86
SCHEMBL11663054 0.86
SCHEMBL22186624 0.83
SCHEMBL28386877 0.77 DNM1 (0.31)
SCHEMBL7110744 0.77 MAOA (0.40)
SCHEMBL2761871 0.74
SCHEMBL10607760 0.74
SCHEMBL27880383 0.74
SCHEMBL6903000 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114152742-B Kit for photoexcitation chemiluminescence immunoassay containing magnetic luminescence microspheres and application of kit 深圳市易瑞生物技术股份有限公司 2024-05-28 CN disclosed
WO-2024053403-A1 GAS BARRIER COATING AGENT, MULTILAYER BODY AND PACKAGING MATERIAL DIC株式会社 2024-03-14 WO disclosed
US-5290665-A Process for developing PS plate requiring no dampening water wherein the developer comprises, water, a solubilizer and an ethylene glycol mono(alkyl C6 -C8) ether derivative FUJI PHOTO FILM CO., LTD. (JP) 1994-03-01 US disclosed
EP-0082724-A1 A polyamide acid, a process for its production and a polyimide produced therefrom JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-06-29 EP disclosed