SCHEMBL9327243

SCHEMBL9327243

Nc1ccc(C(c2ccc(C(=O)O)cc2)(C(F)(F)F)C(F)(F)F)cc1O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRD5A2 P31213 4/20 0.44
ESR1 P03372 1/20 0.42
ESR2 Q92731 1/20 0.42
KDM4E B2RXH2 3/20 0.41
HSD17B10 Q99714 2/20 0.41
ALDH1A1 P00352 1/20 0.41
HPGD P15428 1/20 0.41
RXRA P19793 1/20 0.41
RXRB P28702 1/20 0.41
RXRG P48443 1/20 0.41
MAP4K4 O95819 1/20 0.39
SLC6A2 P23975 1/20 0.39
P2RY14 Q15391 1/20 0.39
CDC25B P30305 1/20 0.38
LMNA P02545 2/20 0.37
CA12 O43570 2/20 0.37
CA1 P00915 2/20 0.37
CA2 P00918 2/20 0.37
CA4 P22748 2/20 0.37
CA6 P23280 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL766058 0.85 ESR1 (0.50) ESR1ESR2KDM4EHSD17B10ALDH1A1
SCHEMBL29399630 0.85 ESR1 (0.50) ESR1ESR2KDM4EHSD17B10ALDH1A1
SCHEMBL29412586 0.85 ESR1 (0.50) ESR1ESR2KDM4EHSD17B10ALDH1A1
SCHEMBL336470 0.82 SRD5A2 (0.61) SRD5A2ESR1ESR2ALDH1A1HPGD
Hydrochloric Acid SCHEMBL8505603 0.80 SRD5A2 (0.59) SRD5A2ESR1ESR2ALDH1A1HPGD
Hydrochloric Acid SCHEMBL19837805 0.80 SRD5A2 (0.59) SRD5A2ESR1ESR2ALDH1A1HPGD
SCHEMBL14030840 0.80 HDAC6 (0.45) ESR1ESR2KDM4EHSD17B10ALDH1A1
SCHEMBL4295432 0.79 ALDH1A1 (0.52) ESR1ESR2KDM4EHSD17B10ALDH1A1
SCHEMBL9291271 0.79 SRD5A2 (0.48) SRD5A2ESR1ESR2KDM4EHSD17B10
SCHEMBL9742570 0.79 ESR1 (0.69) SRD5A2ESR1ESR2ALDH1A1RXRA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0291778-B1 Process for the preparation of high temperature-resistant dielectrics SIEMENS AG (DE) 1994-03-16 EP disclosed
US-4965134-A Method for manufacturing highly heat-resistant dielectrics SIEMENS AKTIENGESELLSCHAFT (DE) 1990-10-23 US disclosed
EP-0291778-A1 Process for the preparation of high temperature-resistant dielectrics SIEMENS AKTIENGESELLSCHAFT (DE) 1988-11-23 EP disclosed