Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 3/20 | 0.50 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 3/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | GAA | P10253 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | PKM | P14618 | 2/20 | 0.39 |
| ▸ | RECQL | P46063 | 1/20 | 0.39 |
| ▸ | AR | P10275 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29399630 | 1.00 | ESR1 (0.50) | ESR1ESR2HSD17B10ALOX15CYP3A4 | |
| SCHEMBL29412586 | 1.00 | ESR1 (0.50) | ESR1ESR2HSD17B10ALOX15CYP3A4 | |
| SCHEMBL4295432 | 0.93 | ALDH1A1 (0.52) | ESR1ESR2HSD17B10ALOX15CYP3A4 | |
| SCHEMBL9687133 | 0.91 | ESR1 (0.44) | ESR1ESR2HSD17B10ALOX15CYP3A4 | |
| SCHEMBL9327243 | 0.85 | SRD5A2 (0.44) | ESR1ESR2HSD17B10MEN1KMT2A | |
| SCHEMBL29360962 | 0.83 | ALDH1A1 (0.59) | ESR1ESR2HSD17B10ALOX15MEN1 | |
| SCHEMBL29379543 | 0.83 | ALDH1A1 (0.59) | ESR1ESR2HSD17B10ALOX15MEN1 | |
| SCHEMBL5958751 | 0.83 | HSD17B10 (0.46) | ESR1ESR2HSD17B10ALOX15CYP3A4 | |
| SCHEMBL26579 | 0.83 | ALDH1A1 (0.59) | ESR1ESR2HSD17B10ALOX15MEN1 | |
| SCHEMBL3947426 | 0.83 | HSD17B10 (0.50) | ESR1ESR2HSD17B10ALOX15CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 637 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024216910-A1 | HIGH-CHEMICAL-RESISTANCE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF | 明士(北京)新材料开发有限公司 | 2024-10-24 | — | — | WO | claimed |
| EP-2063002-B1 | Method for depositing and patterning carbon nanotubes using chemical self-assembly process | SAMSUNG ELECTRONICS CO LTD (KR) | 2011-11-23 | — | — | EP | claimed |
| EP-1455007-B1 | Method for depositing and patterning carbon nanotubes using chemical self-assembly process | SAMSUNG ELECTRONICS CO LTD (KR) | 2010-06-02 | — | — | EP | claimed |
| EP-2063002-A2 | Method for depositing and patterning carbon nanotubes using chemical self-assembly process | Samsung Electronics Co., Ltd. (KR) | 2009-05-27 | — | — | EP | claimed |
| US-6960425-B2 | Method for laminating and patterning carbon nanotubes using chemical self-assembly process | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-11-01 | — | — | US | claimed |
| US-6875554-B2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-04-05 | — | — | US | claimed |
| EP-1455007-A2 | Method for depositing and patterning carbon nanotubes using chemical self-assembly process | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-09-08 | — | — | EP | claimed |
| US-20040142285-A1 | Method for laminating and patterning carbon nanotubes using chemical self-assembly process | SAMSUNG ELECTRONICS CO., LTD. | 2004-07-22 | — | — | US | claimed |
| US-6001534-A | A PHOTOPOLYMERIZABLE POLYIMIDE-SILOXANE COPOLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-12-14 | — | — | US | claimed |
| US-5478914-A | Polyimides and processes for preparaing the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-12-26 | — | — | US | claimed |
| US-5399655-A | Acid-labile poly(amic acetal ester) | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-03-21 | — | — | US | claimed |
| US-20260147277-A1 | TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE | FUJIFILM CORPORATION (JP) | 2026-05-28 | — | — | US | disclosed |
| EP-3893054-B1 | PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM CORP (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-28 | — | — | US | disclosed |
| EP-3633455-B1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYMERIC PRECURSOR, CURED FILM, LAMINATE, CURED FILM PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2026-04-08 | — | — | EP | disclosed |
| US-4886874-A | BLOCK POLYMER CONTAINING PHENYLENEDIAMINE AND OXYDIANILINE UNITS | KANEGAFUCHI CHEMICAL IND. CO., LTD. (JP) | 1989-12-12 | — | — | US | disclosed |
| US-4845183-A | MOLDING MATERIALS; FOR DIELECTRICS OR COATING SOLUTIONS; TOUGHNESS, FLEXIBILITY, TRANSPARENT | HOECHST CELANESE CORPORATION (US) | 1989-07-04 | — | — | US | disclosed |
| EP-0317942-A2 | Heat resistant polyamides and polybenzoxazoles from bis-[(aminohydroxyphenyl hexafluoro-isopropyl] diphenyl ethers | HOECHST CELANESE CORPORATION (US) | 1989-05-31 | — | — | EP | disclosed |
| EP-0277547-A2 | Polyimide having thermal dimensional stability | Kanegafuchi Chemical Industry Co., Ltd. (JP) | 1988-08-10 | — | — | EP | disclosed |
| EP-0276405-A2 | Polyimide having a thermal dimensional stability | Kanegafuchi Chemical Industry Co., Ltd. (JP) | 1988-08-03 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ARCN1, GLRA1, PSMA1 | ESR1 3154/4885ESR2 1998/4885HSD17B10 3992/4885 |
| US-20260147277-A1 | TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE | LCP1, PCNA, FDFT1 | ESR1 769/4885ESR2 2353/4885HSD17B10 2181/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.