SCHEMBL9338809

SCHEMBL9338809

CCCCOC(=O)c1ccc(C2CCCCC2)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.61
SMN1; SMN2 Q16637 2/20 0.61
MAPT P10636 2/20 0.61
ESR1 P03372 3/20 0.59
LMNA P02545 2/20 0.59
CYP1A2 P05177 2/20 0.59
TSHR P16473 2/20 0.59
CYP2C19 P33261 2/20 0.59
CYP2D6 P10635 1/20 0.59
MAPK1 P28482 1/20 0.59
NR1H2 P55055 1/20 0.59
RNASEL Q05823 1/20 0.59
CYP3A4 P08684 1/20 0.57
CYP2C9 P11712 1/20 0.57
PDE4D Q08499 1/20 0.57
HPGD P15428 1/20 0.52
RECQL P46063 1/20 0.52
RAB9A P51151 2/20 0.52
HSD17B10 Q99714 1/20 0.52
NPC1 O15118 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28947366 0.94 ALDH1A1 (0.59) ALDH1A1SMN1; SMN2MAPTESR1LMNA
SCHEMBL29808012 0.94 ALDH1A1 (0.59) ALDH1A1SMN1; SMN2MAPTESR1LMNA
SCHEMBL15907634 0.94 ALDH1A1 (0.59) ALDH1A1SMN1; SMN2MAPTESR1LMNA
SCHEMBL1789154 0.85 ALDH1A1 (0.63) ALDH1A1SMN1; SMN2MAPTESR1LMNA
SCHEMBL11297538 0.84 LMNA (0.55) ALDH1A1SMN1; SMN2MAPTLMNACYP1A2
SCHEMBL10910992 0.83 LMNA (0.52) ALDH1A1SMN1; SMN2MAPTESR1LMNA
SCHEMBL10910978 0.83 LMNA (0.52) ALDH1A1SMN1; SMN2MAPTESR1LMNA
SCHEMBL10910987 0.83 LMNA (0.52) ALDH1A1SMN1; SMN2MAPTESR1LMNA
SCHEMBL11039080 0.82 ALDH1A1 (0.55) ALDH1A1SMN1; SMN2MAPTESR1LMNA
SCHEMBL15043559 0.82 ALDH1A1 (0.58) ALDH1A1SMN1; SMN2MAPTESR1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0294220-B1 Photopolymerizable composition HITACHI CHEMICAL CO LTD (JP) 1994-05-25 EP disclosed
US-5034429-A An unsaturated monomer, a photoinitiator and a benzene derivative for providing a cured film HITACHI CHEMICAL CO., LTD. (JP) 1991-07-23 US disclosed
EP-0294220-A2 Photopolymerizable composition Hitachi Chemical Co., Ltd. (JP) 1988-12-07 EP disclosed