Formamide

Formamide

SCHEMBL9342277

NC=O.Nc1cc2nc3ccccc3nc2cc1N

nearest known ligand 0.78

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 6/20 0.78
KMT2A Q03164 6/20 0.78
POLB P06746 4/20 0.78
NPC1 O15118 4/20 0.78
MEN1 O00255 3/20 0.78
USP2 O75604 1/20 0.78
CACNA1B Q00975 1/20 0.78
APBA1 Q02410 1/20 0.78
L3MBTL1 Q9Y468 1/20 0.78
NQO2 P16083 6/20 0.50
ALDH1A1 P00352 6/20 0.46
KDM4E B2RXH2 6/20 0.46
HPGD P15428 5/20 0.46
GAA P10253 3/20 0.46
HSD17B10 Q99714 3/20 0.46
RAB9A P51151 5/20 0.42
GLA P06280 4/20 0.42
LMNA P02545 3/20 0.42
PTBP1 P26599 1/20 0.42
RCE1 Q9Y256 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29351539 0.89 MAPT (1.00) MAPTKMT2APOLBNPC1MEN1
SCHEMBL188079 0.89 MAPT (1.00) MAPTKMT2APOLBNPC1MEN1
SCHEMBL28866712 0.86 MAPT (0.95) MAPTKMT2APOLBNPC1MEN1
Ammonia Solution, Strong SCHEMBL18919853 0.86 MAPT (0.95) MAPTKMT2APOLBNPC1MEN1
Hydrochloric Acid SCHEMBL27822095 0.86 MAPT (0.95) MAPTKMT2APOLBNPC1MEN1
Phenazine SCHEMBL27991538 0.86 MAPT (0.65) MAPTKMT2APOLBNPC1MEN1
Hydrochloric Acid SCHEMBL27822317 0.84 MAPT (0.90) MAPTKMT2APOLBNPC1MEN1
SCHEMBL15174658 0.84 MAPT (0.90) MAPTKMT2APOLBNPC1MEN1
Acridine SCHEMBL27860754 0.77 ALDH1A1 (0.71) MAPTKMT2APOLBNPC1MEN1
SCHEMBL837057 0.75 KMT2A (0.72) MAPTKMT2APOLBNPC1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5298220-A Forming a coating of a solution containing anioic and cationic dyes and water insoluble organonitrogen compound, drying SHIN-ETSU CHEMICAL CO., LTD. (JP) 1994-03-29 US disclosed
US-5196164-A During addition polymerization, wall coating of anionic dye and cationic dye and organonitrogen compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 1993-03-23 US disclosed