SCHEMBL9359540

SCHEMBL9359540

COc1ccc(N2N=C(/C=C/c3ccccc3Cl)CC2c2ccccc2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 4/20 0.51
▸ KMT2A Q03164 4/20 0.51
▸ USP2 O75604 1/20 0.51
▸ TDP1 Q9NUW8 1/20 0.51
▸ NFE2L2 Q16236 2/20 0.49
▸ RELA Q04206 1/20 0.49
▸ L3MBTL1 Q9Y468 6/20 0.48
▸ KDM4E B2RXH2 4/20 0.48
▸ ALDH1A1 P00352 4/20 0.48
▸ MAPT P10636 4/20 0.48
▸ LMNA P02545 1/20 0.48
▸ CA1 P00915 1/20 0.47
▸ CA2 P00918 1/20 0.47
▸ GAA P10253 3/20 0.46
▸ NPSR1 Q6W5P4 3/20 0.46
▸ GLA P06280 3/20 0.46
▸ PDE5A O76074 6/20 0.46
▸ ATM Q13315 3/20 0.45
▸ S1PR4 O95977 1/20 0.45
▸ S1PR1 P21453 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9359546 1.00 MEN1 (0.51) MEN1KMT2AUSP2TDP1NFE2L2
SCHEMBL2252517 0.85 MEN1 (0.58) MEN1KMT2AUSP2TDP1L3MBTL1
SCHEMBL2024866 0.80 MEN1 (0.56) MEN1KMT2AUSP2TDP1L3MBTL1
SCHEMBL28152939 0.80 MEN1 (0.56) MEN1KMT2AUSP2TDP1L3MBTL1
SCHEMBL28932534 0.80 MEN1 (0.55) MEN1KMT2AUSP2TDP1L3MBTL1
SCHEMBL9359545 0.80 MEN1 (0.56) MEN1KMT2AUSP2TDP1L3MBTL1
SCHEMBL2253846 0.78 MEN1 (0.53) MEN1KMT2AUSP2TDP1L3MBTL1
SCHEMBL26130193 0.78 L3MBTL1 (0.55) MEN1KMT2AUSP2TDP1L3MBTL1
SCHEMBL4410072 0.77 MAPT (0.45) MEN1KMT2ATDP1L3MBTL1KDM4E
SCHEMBL15024024 0.77 MAPT (0.45) MEN1KMT2ATDP1L3MBTL1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0451561-B1 Photopolymerisable mixture and recording material made from it MORTON INT INC (US) 1994-11-09 — — EP disclosed
US-5221595-A Printing plates, photoresist; high photosensitivity, acid resistance HOECHST AKTIENGESELLSCHAFT (DE) 1993-06-22 — — US disclosed
EP-0451561-A1 Photopolymerisable mixture and recording material made from it MORTON INTERNATIONAL, INC. (US) 1991-10-16 — — EP disclosed
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