SCHEMBL939874

SCHEMBL939874

Cc1ccc(S(=O)(=O)O)c([Si](C)(C)C)c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 3/20 0.40
HSD17B10 Q99714 2/20 0.40
ALDH1A1 P00352 7/20 0.37
MAPT P10636 3/20 0.37
POLB P06746 3/20 0.37
KMT2A Q03164 2/20 0.37
KDM4E B2RXH2 2/20 0.37
TDP1 Q9NUW8 2/20 0.37
L3MBTL1 Q9Y468 2/20 0.37
RECQL P46063 2/20 0.37
MEN1 O00255 1/20 0.37
CASP6 P55212 1/20 0.37
ELAVL1 Q15717 1/20 0.37
MPL P40238 1/20 0.35
MAOA P21397 1/20 0.35
MAOB P27338 1/20 0.35
MEP1B Q16820 1/20 0.34
LMNA P02545 2/20 0.33
MYC P01106 1/20 0.33
SNCA P37840 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL3135477 0.98 GAA (0.39) GAAHSD17B10ALDH1A1MAPTPOLB
SCHEMBL2057274 0.84 GAA (0.37) GAAHSD17B10ALDH1A1MAPTPOLB
SCHEMBL2057524 0.82 GAA (0.36) GAAHSD17B10ALDH1A1MAPTPOLB
SCHEMBL2057292 0.82 HSD17B10 (0.36) GAAHSD17B10ALDH1A1MAPTPOLB
SCHEMBL2057925 0.81 GAA (0.38) GAAHSD17B10ALDH1A1MAPTPOLB
SCHEMBL2057858 0.81 GAA (0.36) GAAHSD17B10ALDH1A1MAPTPOLB
SCHEMBL2057487 0.80 HSD17B10 (0.37) GAAHSD17B10ALDH1A1MAPTPOLB
SCHEMBL2058278 0.80 GAA (0.37) GAAHSD17B10ALDH1A1MAPTPOLB
SCHEMBL2057509 0.80 HSD17B10 (0.35) GAAHSD17B10ALDH1A1MAPTPOLB
SCHEMBL2057987 0.80 ALDH1A1 (0.37) GAAHSD17B10ALDH1A1MAPTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8394737-B2 Preparation of activating supports TOTAL PETROCHEMICALS RESEARCH FELUY Seneffe (BE) 2013-03-12 US claimed
EP-2031031-B1 Use of a latent acid for improving adhesion SIKA TECHNOLOGY AG (CH) 2011-07-13 EP claimed
US-20110009582-A1 Preparation of Activating Supports TOTAL PETROCHEMICALS RESEARCH FELUY (BE) 2011-01-13 US claimed
EP-2170511-A1 PREPARATION OF ACTIVATING SUPPORTS Total Petrochemicals Research Feluy (BE) 2010-04-07 EP claimed
WO-2009013197-A1 PREPARATION OF ACTIVATING SUPPORTS TOTAL PETROCHEMICALS RESEARCH FELUY (BE) 2009-01-29 WO claimed
EP-0615163-B1 Positive resist material using particular onium salts SHINETSU CHEMICAL CO (JP) 1999-12-29 EP claimed
US-9065146-B2 Nonaqueous electrolyte and lithium secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2015-06-23 US disclosed
US-8551662-B2 Nonaqueous electrolyte and lithium secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2013-10-08 US disclosed
US-8394737-B2 Preparation of activating supports TOTAL PETROCHEMICALS RESEARCH FELUY Seneffe (BE) 2013-03-12 US disclosed
US-8029935-B2 Nonaqueous electrolyte and lithium secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2011-10-04 US disclosed
US-20110229771-A1 NONAQUEOUS ELECTROLYTE AND LITHIUM SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2011-09-22 US disclosed
US-7981553-B2 Nonaqueous electrolyte and lithium secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2011-07-19 US disclosed
US-20110159380-A1 NONAQUEOUS ELECTROLYTE AND LITHIUM SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2011-06-30 US disclosed
US-5847218-A Sulfonium salts and chemically amplified positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-12-08 US disclosed
US-5705702-A REACTING AN ARYL GRIGNARD REAGENT WITH THIONYL CHLORIDE, THEN WITH TRIORGANOSILYL SULFONATE OR TRIORGANOSILYLHALIDE SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-01-06 US disclosed
US-5691112-A P-TOLUENESULFONIC ACID TRIS(P-TERT-BUTOXYPHENYL) SULFONIUM AS PHOTOSENSITIVE ACID GENERATOR; FORMING SOLUBLE SURFACE LAYER SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-11-25 US disclosed
US-5633409-A POSITIVE RESISTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-05-27 US disclosed
US-5624787-A NITROGENOUS COMPOUND AND SULFONIUM COMPOUND FOR POSITIVE PHOTORESISTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-04-29 US disclosed
EP-0665220-A1 Novel sulfonium salt and chemically amplified positive resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 1995-08-02 EP disclosed
US-5426105-A Cardiovascular disorders G.D. SEARLE & CO. (US) 1995-06-20 US disclosed