SCHEMBL939876

SCHEMBL939876

C[Si](C)(C)Cc1ccc(S(=O)(=O)O)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.54
LMNA P02545 2/20 0.46
ALDH1A1 P00352 3/20 0.45
TSHR P16473 2/20 0.45
NT5E P21589 1/20 0.45
SMN1; SMN2 Q16637 3/20 0.43
TDP1 Q9NUW8 2/20 0.41
KDM4E B2RXH2 3/20 0.38
POLB P06746 1/20 0.38
CYP2D6 P10635 1/20 0.38
MAPT P10636 1/20 0.38
HTT P42858 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
CYP1A2 P05177 1/20 0.37
CYP2C9 P11712 1/20 0.37
CA2 P00918 4/20 0.36
CA12 O43570 2/20 0.36
CA1 P00915 2/20 0.36
CA4 P22748 2/20 0.36
CA6 P23280 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2057295 0.82 LMNA (0.42) ESR1LMNAALDH1A1TSHRNT5E
SCHEMBL2057276 0.81 LMNA (0.41) ESR1LMNAALDH1A1TSHRNT5E
SCHEMBL2057602 0.81 TSHR (0.52) LMNAALDH1A1TSHRNT5ESMN1; SMN2
SCHEMBL2057526 0.81 LMNA (0.41) ESR1LMNAALDH1A1TSHRNT5E
SCHEMBL2057902 0.80 CA2 (0.44) LMNAALDH1A1TSHRNT5ESMN1; SMN2
SCHEMBL2057488 0.80 LMNA (0.43) LMNAALDH1A1TSHRNT5ESMN1; SMN2
SCHEMBL2057859 0.80 TDP1 (0.47) ESR1LMNAALDH1A1TSHRNT5E
SCHEMBL2058279 0.79 LMNA (0.42) LMNAALDH1A1TSHRNT5ESMN1; SMN2
SCHEMBL2057927 0.79 LMNA (0.42) LMNAALDH1A1TSHRNT5ESMN1; SMN2
SCHEMBL17678570 0.79 LMNA (0.42) LMNAALDH1A1TSHRNT5ESMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8394737-B2 Preparation of activating supports TOTAL PETROCHEMICALS RESEARCH FELUY Seneffe (BE) 2013-03-12 US claimed
EP-2031031-B1 Use of a latent acid for improving adhesion SIKA TECHNOLOGY AG (CH) 2011-07-13 EP claimed
US-20110009582-A1 Preparation of Activating Supports TOTAL PETROCHEMICALS RESEARCH FELUY (BE) 2011-01-13 US claimed
EP-2170511-A1 PREPARATION OF ACTIVATING SUPPORTS Total Petrochemicals Research Feluy (BE) 2010-04-07 EP claimed
EP-2031031-A1 Use of a latent acid for improving adhesion Sika Technology AG (CH) 2009-03-04 EP claimed
WO-2009013197-A1 PREPARATION OF ACTIVATING SUPPORTS TOTAL PETROCHEMICALS RESEARCH FELUY (BE) 2009-01-29 WO claimed
EP-0143323-B1 PROCESS FOR AN ANTHRACYCLINE DERIVATIVE, AND AN ANTHRACYCLINONE DERIVATIVE USEFUL FOR THE PROCESS SAGAMI CHEMICAL RESEARCH CENTER (JP) 1988-10-26 EP claimed
US-9065146-B2 Nonaqueous electrolyte and lithium secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2015-06-23 US disclosed
US-8551662-B2 Nonaqueous electrolyte and lithium secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2013-10-08 US disclosed
US-8394737-B2 Preparation of activating supports TOTAL PETROCHEMICALS RESEARCH FELUY Seneffe (BE) 2013-03-12 US disclosed
US-8029935-B2 Nonaqueous electrolyte and lithium secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2011-10-04 US disclosed
US-20110229771-A1 NONAQUEOUS ELECTROLYTE AND LITHIUM SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2011-09-22 US disclosed
US-7981553-B2 Nonaqueous electrolyte and lithium secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2011-07-19 US disclosed
EP-1359166-A1 OLEFIN POLYMERIZATION CATALYST, CATALYST COMPONENT FOR OLEFIN POLYMERIZATION, METHOD OF STORING THESE, AND PROCESS FOR PRODUCING OLEFIN POLYMER Sunallomer Ltd (JP) 2003-11-05 EP disclosed
EP-0665220-B1 Novel sulfonium salt and chemically amplified positive resist composition SHINETSU CHEMICAL CO (JP) 1999-04-07 EP disclosed
US-5847218-A Sulfonium salts and chemically amplified positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-12-08 US disclosed
US-5691112-A P-TOLUENESULFONIC ACID TRIS(P-TERT-BUTOXYPHENYL) SULFONIUM AS PHOTOSENSITIVE ACID GENERATOR; FORMING SOLUBLE SURFACE LAYER SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-11-25 US disclosed
US-5633409-A POSITIVE RESISTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-05-27 US disclosed
US-5624787-A NITROGENOUS COMPOUND AND SULFONIUM COMPOUND FOR POSITIVE PHOTORESISTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-04-29 US disclosed
EP-0665220-A1 Novel sulfonium salt and chemically amplified positive resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 1995-08-02 EP disclosed