Diethylamine

Diethylamine

SCHEMBL94063

C=Cc1ccc(C)cc1.CCNCC

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

CCKAR

The experimentally established mechanism targets of Diethylamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.48
CYP2A6 P11509 1/20 0.44
TDP1 Q9NUW8 4/20 0.39
TP53 P04637 3/20 0.39
RAB9A P51151 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
NPC1 O15118 1/20 0.38
MAPT P10636 3/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
TAS1R3 Q7RTX0 1/20 0.38
TAS1R1 Q7RTX1 1/20 0.38
KDM4E B2RXH2 1/20 0.38
POLB P06746 1/20 0.38
RECQL P46063 1/20 0.38
MDM2 Q00987 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
TSHR P16473 1/20 0.37
CHRNB2 P17787 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL679555 0.83 ALDH1A1 (0.69) ALDH1A1CYP2A6TDP1TP53RAB9A
SCHEMBL14911 0.83
Dimethylamine SCHEMBL1333640 0.81 ALDH1A1 (0.58) ALDH1A1CYP2A6TDP1TP53RAB9A
Ammonia Solution, Strong SCHEMBL9397572 0.81 ALDH1A1 (0.65) ALDH1A1CYP2A6TDP1TP53RAB9A
Ethylene SCHEMBL10713150 0.81 ALDH1A1 (0.65) ALDH1A1CYP2A6TDP1TP53RAB9A
Ethane SCHEMBL23051531 0.81 ALDH1A1 (0.65) ALDH1A1CYP2A6TDP1TP53RAB9A
Charcoal, Activated SCHEMBL9462746 0.81 ALDH1A1 (0.65) ALDH1A1CYP2A6TDP1TP53RAB9A
Hydrochloric Acid SCHEMBL9861453 0.81 ALDH1A1 (0.65) ALDH1A1CYP2A6TDP1TP53RAB9A
Hydrochloric Acid SCHEMBL9861440 0.81 ALDH1A1 (0.65) ALDH1A1CYP2A6TDP1TP53RAB9A
SCHEMBL30733322 0.81 ALDH1A1 (0.65) ALDH1A1CYP2A6TDP1TP53RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240101807-A1 FLAME RETARDANT COMPOSITION FOR FOAMED STYRENE RESIN, FLAME-RETARDANT FOAMED STYRENE-BASED RESIN COMPOSITION, AND EXTRUSION FOAM-MOLDED PRODUCT OF SAME DKS CO. LTD. (JP) 2024-03-28 US disclosed
EP-4289896-A1 FLAME RETARDANT COMPOSITION FOR FOAMED STYRENE RESIN, FLAME-RETARDANT FOAMED STYRENE-BASED RESIN COMPOSITION, AND EXTRUSION FOAM-MOLDED PRODUCT OF SAME DKS Co. Ltd. (JP) 2023-12-13 EP disclosed
WO-2023163048-A1 IMMOBILIZED CATALYST, PRODUCTION METHOD FOR IMMOBILIZED CATALYST, PRODUCTION METHOD FOR FORMATE, AND PRODUCTION METHOD FOR FORMIC ACID 日東電工株式会社 2023-08-31 WO disclosed
US-20230089518-A1 FLAME RETARDANT COMPOSITION FOR FOAMED STYRENE RESIN, FLAME-RETARDANT FOAMED-STYRENE-BASED RESIN COMPOSITION, AND EXTRUDED FOAM MOLDED PRODUCT THEREOF DKS CO. LTD. (JP) 2023-03-23 US disclosed
EP-4119635-A1 FLAME RETARDANT COMPOSITION FOR FOAMED STYRENE RESIN, FLAME-RETARDANT FOAMED-STYRENE-BASED RESIN COMPOSITION, AND EXTRUDED FOAM MOLDED PRODUCT THEREOF DKS Co. Ltd. (JP) 2023-01-18 EP disclosed
WO-2022168564-A1 FLAME RETARDANT COMPOSITION FOR FOAMED STYRENE RESIN, FLAME-RETARDANT FOAMED STYRENE-BASED RESIN COMPOSITION, AND EXTRUSION FOAM-MOLDED PRODUCT OF SAME 第一工業製薬株式会社 2022-08-11 WO disclosed
US-11185851-B2 Polymer-supported metal TAKASAGO INTERNATIONAL CORPORATION (JP) 2021-11-30 US disclosed
US-20210009778-A1 FLAME-RESISTANT FOAMED STYRENE-BASED RESIN COMPOSITION DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) 2021-01-14 US disclosed
EP-3670585-A1 FLAME-RESISTANT FOAMED STYRENE-BASED RESIN COMPOSITION Dai-Ichi Kogyo Seiyaku Co., Ltd. (JP) 2020-06-24 EP disclosed
US-10633502-B2 Flame-retardant foamable styrene resin composition DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) 2020-04-28 US disclosed
US-20150344658-A1 FLAME-RETARDANT FOAMED STYRENE RESIN COMPOSITION DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) 2015-12-03 US disclosed
US-9187607-B2 Flame-retarded foamable styrene-based resin compositions DAI-ICHI KOGYO SEIYAKU, CO., LTD. (JP) 2015-11-17 US disclosed
EP-2921520-A1 FLAME-RETARDANT FOAMED STYRENE RESIN COMPOSITION Dai-Ichi Kogyo Seiyaku Co., Ltd. (JP) 2015-09-23 EP disclosed
EP-2426152-B1 FLAME-RETARDANT EXPANDABLE STYRENE RESIN PARTICLES AND METHOD FOR PRODUCING SAME DAI ICHI KOGYO SEIYAKU CO LTD (JP) 2014-06-04 EP disclosed
EP-1983028-B1 FLAME-RETARDANT STYRENE RESIN COMPOSITION DAI ICHI KOGYO SEIYAKU CO LTD (JP) 2012-08-15 EP disclosed
EP-2426152-A1 FLAME-RETARDANT EXPANDABLE STYRENE RESIN PARTICLES AND METHOD FOR PRODUCING SAME Dai-Ichi Kogyo Seiyaku Co., Ltd. (JP) 2012-03-07 EP disclosed
EP-2426165-A1 FLAME-RETARDANT EXPANDABLE STYRENE RESIN COMPOSITION Dai-Ichi Kogyo Seiyaku Co., Ltd. (JP) 2012-03-07 EP disclosed
US-20110319507-A1 FLAME-RETARDED FOAMABLE STYRENE-BASED RESIN BEADS AND PROCESS FOR PRODUCING THE SAME DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) 2011-12-29 US disclosed
US-20100168263-A1 FLAME-RETARDED STYRENE-BASED RESIN COMPOSITIONS DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) 2010-07-01 US disclosed
EP-1983028-A1 FLAME-RETARDANT STYRENE RESIN COMPOSITION Dai-Ichi Kogyo Seiyaku Co., Ltd. (JP) 2008-10-22 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11185851-B2 Polymer-supported metal SOD1, PCNA, MAX ALDH1A1 4117/4885CYP2A6 4425/4885TDP1 2964/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.