SCHEMBL941487

SCHEMBL941487

CCCCC(C)ON

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8511039 0.92
SCHEMBL13267162 0.90 OPRM1 (0.50)
SCHEMBL2549074 0.90 OPRM1 (0.50)
SCHEMBL4916660 0.90 OPRM1 (0.50)
SCHEMBL8501111 0.90 OPRM1 (0.50)
Hydrochloric Acid SCHEMBL27799431 0.87 OPRM1 (0.48)
SCHEMBL7101139 0.82
SCHEMBL15700979 0.82
SCHEMBL14815360 0.82 OPRM1 (0.34)
Sulfuric Acid SCHEMBL11689554 0.79 TP53 (0.60)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116727658-A Preparation method of copper nano-particles, copper nano-particles and application of copper nano-particles 深圳先进电子材料国际创新研究院 2023-09-12 CN claimed
EP-3054459-B1 ELECTRODE HAVING EXCELLENT LIGHT TRANSMITTANCE AND METHOD FOR MANUFACTURING SAME ONES ORGANIC NANO ELECTRONIC SYSTEM CO LTD (KR) 2018-07-11 EP claimed
CN-101684214-B Nanoparticle conductive ink and preparation method thereof KUNSHAN HISENSE ELECTRONICS CO LTD 2014-01-08 CN claimed
EP-1853671-B1 CONDUCTIVE INKS AND MANUFACTURING METHOD THEREOF INKTEC CO LTD (KR) 2013-07-31 EP claimed
CN-101010388-B Conductive ink and method for manufacturing same INKTEC CO LTD 2012-06-06 CN claimed
US-7691294-B2 Conductive inks and manufacturing method thereof INKTEC CO., LTD. (KR) 2010-04-06 US claimed
CN-101684214-A Nanoparticle conductive ink and preparation method thereof KUNSHAN HISENSE ELECTRONICS CO 2010-03-31 CN claimed
US-20080206488-A1 Conductive Inks and Manufacturing Method Thereof INKTEC CO., LTD. (KR) 2008-08-28 US claimed
JP-2008531810-A 2008-08-14 JP claimed
EP-1853671-A1 CONDUCTIVE INKS AND MANUFACTURING METHOD THEREOF Inktec Co., Ltd. (KR) 2007-11-14 EP claimed
CN-101010388-A Conductive ink and method for manufacturing same INKTEC CO LTD (KR) 2007-08-01 CN claimed
WO-2006093398-A1 CONDUCTIVE INKS AND MANUFACTURING METHOD THEREOF INKTEC CO., LTD. (KR) 2006-09-08 WO claimed
US-20240030448-A1 CONDUCTIVE MATERIAL DISPERSION, AND METHODS FOR MANUFACTURING POSITIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY AND LITHIUM ION SECONDARY BATTERY USING SAME MIKUNI SHIKISO KABUSHIKI KAISHA (JP) 2024-01-25 US disclosed
CN-116727658-A Preparation method of copper nano-particles, copper nano-particles and application of copper nano-particles 深圳先进电子材料国际创新研究院 2023-09-12 CN disclosed
EP-4120399-A1 CONDUCTIVE MATERIAL DISPERSION, AND METHODS FOR MANUFACTURING POSITIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY AND LITHIUM ION SECONDARY BATTERY USING SAME Mikuni Shikiso Kabushiki Kaisha (JP) 2023-01-18 EP disclosed
US-20220359876-A1 CONDUCTIVE MATERIAL DISPERSION LIQUID AND ELECTRODE PASTE FOR LITHIUM-ION SECONDARY BATTERY POSITIVE ELECTRODE MIKUNI-COLOR LTD. (JP) 2022-11-10 US disclosed
EP-0686152-A1 ORTHO-SUBSTITUTED 2-METHOXYIMINOPHENYLACETIC ACID METHYLAMIDES BASF AG (DE) 1995-12-13 EP disclosed
EP-0668852-A1 SUBSTITUTED ORTHO-ETHENYL-PHENYL ACETIC ACID DERIVATIVES BASF Aktiengesellschaft (DE) 1995-08-30 EP disclosed
WO-1994019331-A1 ORTHO-SUBSTITUTED 2-METHOXYIMINOPHENYLACETIC ACID METHYLAMIDES BASF AKTIENGESELLSCHAFT (DE) 1994-09-01 WO disclosed
WO-1994011334-A1 SUBSTITUTED ORTHO-ETHENYL-PHENYL ACETIC ACID DERIVATIVES BASF AKTIENGESELLSCHAFT (DE) 1994-05-26 WO disclosed