⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL943478 | 1.00 | — | — | |
| SCHEMBL76665 | 1.00 | — | — | |
| SCHEMBL3107747 | 0.97 | — | — | |
| Vinyl Ether SCHEMBL16053081 | 0.93 | — | — | |
| SCHEMBL1001437 | 0.91 | — | — | |
| SCHEMBL1856794 | 0.87 | NUDT1 (0.30) | — | |
| SCHEMBL77233 | 0.87 | NUDT1 (0.30) | — | |
| SCHEMBL5348482 | 0.86 | — | — | |
| Adipic Acid SCHEMBL6309644 | 0.82 | ABCC4 (0.39) | — | |
| SCHEMBL14700560 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11692093-B2 | Resin composition, method for producing three-dimensional molding using same, and three-dimensional molding | Konica Minolta, Inc. (JP) | 2023-07-04 | — | — | US | disclosed |
| EP-3685989-B1 | OBJECT-GRIPPING ATTACHMENT AND INDUSTRIAL ROBOT USING OBJECT-GRIPPING ATTACHMENT | KONICA MINOLTA INC (JP) | 2023-03-15 | — | — | EP | disclosed |
| US-11421119-B2 | Resin composition, and three-dimensional moulding production method | Konica Minolta, Inc. (JP) | 2022-08-23 | — | — | US | disclosed |
| EP-3670566-B1 | MONOMER COMPOSITION AND CURABLE COMPOSITION CONTAINING SAME | DAICEL CORP (JP) | 2021-02-24 | — | — | EP | disclosed |
| EP-3162830-B1 | MONOMER COMPOSITION AND CURABLE COMPOSITION CONTAINING SAME | DAICEL CORP (JP) | 2021-02-24 | — | — | EP | disclosed |
| US-10882953-B2 | Monomer composition and curable composition containing same | DAICEL CORPORATION (JP) | 2021-01-05 | — | — | US | disclosed |
| US-20200276752-A1 | RESIN COMPOSITION, METHOD FOR MANUFACTURING THREE-DIMENSIONAL OBJECT USING RESIN COMPOSITION, THREE-DIMENSIONAL OBJECT, AND OBJECT-GRIPPING ATTACHMENT, AND INDUSTRIAL ROBOT USING OBJECT-GRIPPING ATTACHMENT | Konica Minolta, Inc. (JP) | 2020-09-03 | — | — | US | disclosed |
| US-20200263023-A1 | RESIN COMPOSITION, METHOD FOR PRODUCING THREE-DIMENSIONAL MOLDING USING SAME, AND THREE-DIMENSIONAL MOLDING | Konica Minolta, Inc. (JP) | 2020-08-20 | — | — | US | disclosed |
| EP-3685989-A1 | RESIN COMPOSITION, METHOD FOR MANUFACTURING THREE-DIMENSIONAL OBJECT USING RESIN COMPOSITION, THREE-DIMENSIONAL OBJECT, AND OBJECT-GRIPPING ATTACHMENT, AND INDUSTRIAL ROBOT USING OBJECT-GRIPPING ATTACHMENT | Konica Minolta, Inc. (JP) | 2020-07-29 | — | — | EP | disclosed |
| EP-3670566-A1 | MONOMER COMPOSITION AND CURABLE COMPOSITION CONTAINING SAME | Daicel Corporation (JP) | 2020-06-24 | — | — | EP | disclosed |
| EP-2851402-A1 | INK COMPOSITION FOR INKJET RECORDING, INKJET RECORDING METHOD, AND PRINTED MATTER | FUJIFILM Corporation (JP) | 2015-03-25 | — | — | EP | disclosed |
| US-20140370250-A1 | INKJET INK COMPOSITION, INKJET RECORDING METHOD, AND PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2014-12-18 | — | — | US | disclosed |
| EP-2669342-A1 | ACTIVE-ENERGY-RAY-CURABLE INKJET INK COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE INKJET INK, AND INKJET RECORDING METHOD | Konica Minolta, Inc. (JP) | 2013-12-04 | — | — | EP | disclosed |
| US-20130307913-A1 | ACTIVE-ENERGY-RAY-CURABLE INKJET INK COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE INKJET INK, AND INKJET RECORDING METHOD | Konica Minolta, Inc. (JP) | 2013-11-21 | — | — | US | disclosed |
| EP-2664628-A1 | RESIN COMPOSITION FOR PHOTOIMPRINTING, PATTERNING METHOD AND ETCHING MASK | Maruzen Petrochemical Co., Ltd. (JP) | 2013-11-20 | — | — | EP | disclosed |
| US-20130288021-A1 | RESIN COMPOSITION FOR PHOTOIMPRINTING, PATTERN FORMING PROCESS AND ETCHING MASK | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-10-31 | — | — | US | disclosed |
| US-20110014499-A1 | UV NANOIMPRINT METHOD, RESIN REPLICA MOLD AND METHOD FOR PRODUCING THE SAME, MAGNETIC RECORDING MEDIUM AND METHOD FOR PRODUCING THE SAME, AND MAGNETIC RECORDING/REPRODUCING APPARATUS | SHOWA DENKO K.K. | 2011-01-20 | — | — | US | disclosed |
| EP-2256788-A1 | UV NANOIMPRINT METHOD, RESIN REPLICA MOLD AND METHOD FOR PRODUCING THE SAME, MAGNETIC RECORDING MEDIUM AND METHOD FOR PRODUCING THE SAME, AND MAGNETIC RECORDING/REPRODUCING APPARATUS | Showa Denko K.K. (JP) | 2010-12-01 | — | — | EP | disclosed |
| US-20100255211-A1 | ACTINIC ENERGY RADIATION CURABLE INK-JET INK AND INK-JET IMAGE FORMING METHOD | KONICA MINOLTA IJ TECHNOLOGIES, INC. (JP) | 2010-10-07 | — | — | US | disclosed |
| EP-2236568-A1 | Actinic energy radiation curable ink-jet ink and ink-jet image forming method | Konica Minolta IJ Technologies, Inc. (JP) | 2010-10-06 | — | — | EP | disclosed |