⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL941560 | 1.00 | — | — | |
| SCHEMBL76665 | 1.00 | — | — | |
| SCHEMBL3107747 | 0.97 | — | — | |
| Vinyl Ether SCHEMBL16053081 | 0.93 | — | — | |
| SCHEMBL1001437 | 0.91 | — | — | |
| SCHEMBL1856794 | 0.87 | NUDT1 (0.30) | — | |
| SCHEMBL77233 | 0.87 | NUDT1 (0.30) | — | |
| SCHEMBL5348482 | 0.86 | — | — | |
| Adipic Acid SCHEMBL6309644 | 0.82 | ABCC4 (0.39) | — | |
| SCHEMBL14700560 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2851402-B1 | INK COMPOSITION FOR INKJET RECORDING, INKJET RECORDING METHOD, AND PRINTED MATTER | FUJIFILM CORP (JP) | 2020-05-06 | — | — | EP | disclosed |
| EP-2913186-B1 | INK JET RECORDING DEVICE AND INK JET RECORDING METHOD | FUJIFILM CORP (JP) | 2017-08-16 | — | — | EP | disclosed |
| US-9399693-B2 | Resin composition for photoimprinting, pattern forming process and etching mask | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2016-07-26 | — | — | US | disclosed |
| US-9248668-B2 | Inkjet recording apparatus and inkjet recording method | FUJIFILM CORPORATION (JP) | 2016-02-02 | — | — | US | disclosed |
| EP-2913186-A1 | INK JET RECORDING DEVICE AND INK JET RECORDING METHOD | FUJIFILM Corporation (JP) | 2015-09-02 | — | — | EP | disclosed |
| US-20150231892-A1 | INKJET RECORDING APPARATUS AND INKJET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2015-08-20 | — | — | US | disclosed |
| EP-2664628-B1 | RESIN COMPOSITION FOR PHOTOIMPRINTING, PATTERN FORMING PROCESS AND ETCHING MASK | MARUZEN PETROCHEM CO LTD (JP) | 2015-08-12 | — | — | EP | disclosed |
| EP-2851402-A1 | INK COMPOSITION FOR INKJET RECORDING, INKJET RECORDING METHOD, AND PRINTED MATTER | FUJIFILM Corporation (JP) | 2015-03-25 | — | — | EP | disclosed |
| US-20140370250-A1 | INKJET INK COMPOSITION, INKJET RECORDING METHOD, AND PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2014-12-18 | — | — | US | disclosed |
| EP-2664628-A1 | RESIN COMPOSITION FOR PHOTOIMPRINTING, PATTERNING METHOD AND ETCHING MASK | Maruzen Petrochemical Co., Ltd. (JP) | 2013-11-20 | — | — | EP | disclosed |
| US-20130288021-A1 | RESIN COMPOSITION FOR PHOTOIMPRINTING, PATTERN FORMING PROCESS AND ETCHING MASK | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-10-31 | — | — | US | disclosed |
| US-20110014499-A1 | UV NANOIMPRINT METHOD, RESIN REPLICA MOLD AND METHOD FOR PRODUCING THE SAME, MAGNETIC RECORDING MEDIUM AND METHOD FOR PRODUCING THE SAME, AND MAGNETIC RECORDING/REPRODUCING APPARATUS | SHOWA DENKO K.K. | 2011-01-20 | — | — | US | disclosed |
| EP-2256788-A1 | UV NANOIMPRINT METHOD, RESIN REPLICA MOLD AND METHOD FOR PRODUCING THE SAME, MAGNETIC RECORDING MEDIUM AND METHOD FOR PRODUCING THE SAME, AND MAGNETIC RECORDING/REPRODUCING APPARATUS | Showa Denko K.K. (JP) | 2010-12-01 | — | — | EP | disclosed |