SCHEMBL9425979

SCHEMBL9425979

CC(C)(O)Oc1ccc(C(C)(C)c2ccc(OC(C)(C)O)cc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.48
ESR2 Q92731 3/20 0.48
HPGD P15428 3/20 0.48
TSHR P16473 3/20 0.48
CYP3A4 P08684 3/20 0.48
AR P10275 2/20 0.48
SLC6A2 P23975 1/20 0.48
SLC6A4 P31645 1/20 0.48
HTR6 P50406 1/20 0.48
ESRRG P62508 1/20 0.48
SLC6A3 Q01959 1/20 0.48
HSD17B10 Q99714 1/20 0.48
ALDH1A1 P00352 4/20 0.41
MEN1 O00255 6/20 0.40
KMT2A Q03164 6/20 0.40
MAPT P10636 3/20 0.40
TP53 P04637 2/20 0.40
HIF1A Q16665 2/20 0.40
CYP1A2 P05177 2/20 0.40
PPARG P37231 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7062451 0.86 ESR1 (0.48) ESR1ESR2HPGDTSHRCYP3A4
SCHEMBL18069674 0.81 AR (0.41) ESR1ESR2HPGDTSHRCYP3A4
SCHEMBL196629 0.80 HPGD (0.46) ESR1ESR2HPGDTSHRCYP3A4
SCHEMBL2483852 0.79 ESR2 (0.64) ESR1ESR2HPGDTSHRCYP3A4
SCHEMBL28498001 0.79 ALDH1A1 (0.55) ESR1ESR2HPGDTSHRCYP3A4
SCHEMBL28497693 0.77 CYP3A4 (0.59) ESR1TSHRCYP3A4ARSLC6A2
SCHEMBL11316223 0.76 HPGD (0.42) ESR1ESR2HPGDTSHRCYP3A4
SCHEMBL77569 0.76 MEN1 (0.41) CYP3A4ALDH1A1MEN1KMT2AMAPT
SCHEMBL7187594 0.76 PPARA (0.59) HPGDTSHRCYP3A4SLC6A2SLC6A3
SCHEMBL24487 0.76 ESR2 (0.67) ESR1ESR2HPGDTSHRCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4468445-A BISPHENOL-EPICHLOROHYDRIN COPOLYMER RICOH COMPANY, LTD. TOKYO, JAPAN A CORP.OF (JP) 1984-08-28 US claimed
JP-59170858-A None JP disclosed
US-5322752-A Development process for abrasion resistant documents XEROX CORPORATION (US) 1994-06-21 US disclosed
US-5156709-A Optically detectable stripe which becomes transparent on application of heat or pressure XEROX CORPORATION (US) 1992-10-20 US disclosed
US-4923775-A Photoreceptor overcoated with a polysiloxane XEROX CORPORATION (US) 1990-05-08 US disclosed
US-4895783-A SOLVENT RESISTANCE, WEAR RESISTANCE XEROX CORPORATION (US) 1990-01-23 US disclosed
US-4846996-A Liquid, non-crystallizing two mole diphenol alkoxylate mixtures MILLIKEN RESEARCH CORPORATION (US) 1989-07-11 US disclosed
US-4788123-A XEROGRAPHY XEROX CORPORATION (US) 1988-11-29 US disclosed
US-4672018-A Flash fusing process with prespheroidized toner XEROX CORPORATION (US) 1987-06-09 US disclosed
EP-0095910-B1 A PROCESS FOR PREPARING OVERCOATED ELECTROPHOTOGRAPHIC IMAGING MEMBERS XEROX CORPORATION (US) 1987-04-08 EP disclosed
US-4634649-A Developer compositions XEROX CORPORATION (US) 1987-01-06 US disclosed
US-4606934-A CROSSLINKED SILOXANOL-COLLODIAL SILICA HYBRID XEROX CORPORATION (US) 1986-08-19 US disclosed
US-4595602-A Process for preparing overcoated electrophotographic imaging members XEROX CORPORATION (US) 1986-06-17 US disclosed
US-4565760-A Protective overcoatings for photoresponsive imaging members XEROX CORPORATION (US) 1986-01-21 US disclosed
US-4520092-A Process for preventing deposition of toner particles in an imaging apparatus XEROX CORPORATION (US) 1985-05-28 US disclosed
JP-S59170858-A ELECTROPHOTOGRAPHIC DEVELOPER COMPOSITION RICOH CO LTD 1984-09-27 JP disclosed
US-4468445-A BISPHENOL-EPICHLOROHYDRIN COPOLYMER RICOH COMPANY, LTD. TOKYO, JAPAN A CORP.OF (JP) 1984-08-28 US disclosed
US-4467023-A Layered photoresponsive device containing hole injecting ground electrode XEROX CORPORATION (US) 1984-08-21 US disclosed
US-4439509-A Process for preparing overcoated electrophotographic imaging members XEROX CORPORATION (US) 1984-03-27 US disclosed