SCHEMBL94313

SCHEMBL94313

Cc1ccc(OOC(=O)c2ccccc2)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ F2 P00734 1/20 0.57
▸ LMNA P02545 1/20 0.57
▸ CES2 O00748 1/20 0.52
▸ CES1 P23141 1/20 0.52
▸ NPC1 O15118 3/20 0.51
▸ RAB9A P51151 3/20 0.51
▸ TDP1 Q9NUW8 4/20 0.50
▸ ALDH1A1 P00352 4/20 0.50
▸ TSHR P16473 2/20 0.50
▸ HSD17B10 Q99714 1/20 0.50
▸ NPSR1 Q6W5P4 1/20 0.49
▸ KMT2A Q03164 5/20 0.49
▸ MAPT P10636 3/20 0.49
▸ L3MBTL1 Q9Y468 1/20 0.49
▸ PKM P14618 1/20 0.49
▸ MEN1 O00255 2/20 0.47
▸ PARP10 Q53GL7 1/20 0.47
▸ SMN1; SMN2 Q16637 1/20 0.44
▸ PTK2B Q14289 1/20 0.44
▸ RXFP1 Q9HBX9 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10560176 0.90 F2 (0.70) F2LMNACES2CES1RAB9A
SCHEMBL28209322 0.87 ALDH1A1 (0.50) F2LMNACES2CES1NPC1
SCHEMBL5244678 0.86 F2 (0.70) F2LMNACES2CES1RAB9A
Benzoic Acid 4-Methylphenyl Ester SCHEMBL1546372 0.85 KMT2A (0.66) LMNACES2CES1NPC1RAB9A
SCHEMBL6554993 0.84 LMNA (0.74) F2LMNACES2CES1NPC1
SCHEMBL10560170 0.83 LMNA (0.59) F2LMNACES2RAB9ATDP1
SCHEMBL15382236 0.83 PARP10 (0.68) LMNACES2CES1NPC1RAB9A
SCHEMBL26038899 0.83 PARP10 (0.68) LMNACES2CES1NPC1RAB9A
SCHEMBL28051725 0.83 F2 (0.59) F2LMNACES2CES1TDP1
Benzoyl Peroxide SCHEMBL11146753 0.82 LMNA (0.77) F2LMNACES2CES1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 178 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8173048-B2 Composition for circuit connection film and circuit connection film using the same CHEIL INDUSTRIES, INC. (KR) 2012-05-08 — — US claimed
US-20100148130-A1 Composition for circuit connection film and circuit connection film using the same KUKDO ADVANCED MATERIALS CO., LTD. (KR) 2010-06-17 — — US claimed
CN-1328254-C Metal bis (trifluoromethanesulfonyl) imide compounds and methods of synthesizing metal bis (trifluoromethanesulfonyl) imide compounds UNIV BELFAST (GB) 2007-07-25 — — CN claimed
EP-4679493-A1 METHOD FOR PRODUCING THIN WAFER, WAFER LAMINATE AND TEMPORARY ADHESIVE FOR WAFER PROCESSING SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-01-14 — — EP disclosed
US-20250346702-A1 COMPOSITION THAT CONTAINS COMPOUND HAVING POLYOXYALKYLENE CHAIN AND ACRYLIC COPOLYMER RESONAC CORP (JP) 2025-11-13 — — US disclosed
US-20250297092-A1 COMPOSITION THAT CONTAINS COMPOUND HAVING POLYOXYALKYLENE CHAIN AND ESTER-BASED THIXOTROPY-IMPARTING AGENT RESONAC CORPORATION (JP) 2025-09-25 — — US disclosed
WO-2025109868-A1 THERMOSETTING SILICONE COMPOSITION, DIE BONDING MATERIAL, AND OPTICAL SEMICONDUCTOR DEVICE 信越化学工業株式会社 2025-05-30 — — WO disclosed
EP-4512837-A1 COMPOSITION THAT CONTAINS COMPOUND HAVING POLYOXYALKYLENE CHAIN AND ACRYLIC COPOLYMER Resonac Corporation (JP) 2025-02-26 — — EP disclosed
WO-2025018368-A1 ADHESIVE COMPOSITION, ADHESIVE FILM FOR CIRCUIT CONNECTION, CONNECTED STRUCTURE, AND METHOD FOR PRODUCING CONNECTED STRUCTURE 株式会社レゾナック 2025-01-23 — — WO disclosed
WO-2025013758-A1 ADHESIVE AGENT COMPOSITION, ADHESIVE AGENT FILM FOR CIRCUIT CONNECTION, CIRCUIT CONNECTION STRUCTURE, AND METHOD FOR MANUFACTURING SAME 株式会社レゾナック 2025-01-16 — — WO disclosed
US-20250022829-A1 UNDERFILL MATERIAL AJINOMOTO CO., INC. (JP) 2025-01-16 — — US disclosed
EP-1057843-B1 Aqueous emulsion, process for producing the same and aqueous paint and aqueous printing ink comprising the same NIPPON POLYURETHANE KOGYO KK (JP) 2004-09-15 — — EP disclosed
CN-1507371-A Metal bis (trifluoromethanesulfonyl) imide compounds and methods of synthesizing metal bis (trifluoromethanesulfonyl) imide compounds ʺ��ѧ 2004-06-23 — — CN disclosed
US-20030178138-A1 Method for connecting electrodes, surface-treated wiring board and adhesive film used in the method, and electrode-connected structure HITACHI CHEMICAL CO., LTD. (JP) 2003-09-25 — — US disclosed
US-20030141014-A1 Mixture of electroconductive particles and polymer HITACHI CHEMICAL CO., LTD. (JP) 2003-07-31 — — US disclosed
US-6306947-B1 Printing ink and paint composed of an aqueous emulsion of self-emulsifiable urethane copolymer NIPPON POLYURETHANE INDUSTRY CO., LTD. (JP) 2001-10-23 — — US disclosed
EP-1057843-A1 Aqueous emulsion, process for producing the same and aqueous paint and aqueous printing ink comprising the same NIPPON POLYURETHANE INDUSTRY CO. LTD. (JP) 2000-12-06 — — EP disclosed
US-4684670-A CROSSLINKING BY HYDROSILATION, PERBENZOATE OR POLYAROMATIC KETONE INITIATORS GENERAL ELECTRIC COMPANY (US) 1987-08-04 — — US disclosed
US-4608312-A MERCAPTOALKOXYALKYL POLYSILOXANES AND VINYL POLYSILOXANES GENERAL ELECTRIC COMPANY (US) 1986-08-26 — — US disclosed
US-4558147-A ODORLESS MERCAPTOALKOXYALKYL-FUNCTIONAL POLYSILOXANES AND VINYL-FUNCTIONAL PHOTOREACTIVE TERPOLYMERS GENERAL ELECTRIC COMPANY (US) 1985-12-10 — — US disclosed
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