SCHEMBL9435765

SCHEMBL9435765

ClCCCCc1cccs1

nearest known ligand 0.59

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 2/20 0.59
TSHR P16473 2/20 0.51
ADRA2A P08913 3/20 0.44
ADRA2B P18089 3/20 0.44
ADRA2C P18825 3/20 0.44
NPC1 O15118 3/20 0.44
CYP2C19 P33261 1/20 0.42
SMN1; SMN2 Q16637 2/20 0.41
ALDH1A1 P00352 1/20 0.41
POLB P06746 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
PTGS1 P23219 1/20 0.41
PTGS2 P35354 1/20 0.41
HCAR2 Q8TDS4 1/20 0.40
RAB9A P51151 2/20 0.40
GPR84 Q9NQS5 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3194709 0.98 TAAR1 (0.57) TAAR1TSHRADRA2AADRA2BADRA2C
SCHEMBL4847978 0.98 TAAR1 (0.57) TAAR1TSHRADRA2AADRA2BADRA2C
SCHEMBL9436069 0.98 TAAR1 (0.57) TAAR1TSHRADRA2AADRA2BADRA2C
SCHEMBL1769146 0.93
SCHEMBL20146704 0.89 TAAR1 (0.73) TAAR1TSHRADRA2AADRA2BADRA2C
SCHEMBL8571535 0.86 TAAR1 (0.70) TAAR1TSHRADRA2AADRA2BADRA2C
SCHEMBL7116263 0.86 TAAR1 (0.70) TAAR1TSHRADRA2AADRA2BADRA2C
SCHEMBL6734915 0.86 TAAR1 (0.70) TAAR1TSHRADRA2AADRA2BADRA2C
SCHEMBL1309426 0.84
SCHEMBL20135772 0.84 TAAR1 (0.73) TAAR1TSHRADRA2AADRA2BADRA2C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5306601-A Laminating a semiconductor a polythiophenes layer, inorganic layer and photoresists layer, heating and hardening each layer MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1994-04-26 US disclosed
EP-0348961-B1 Fine pattern forming material and pattern forming method MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 1994-01-26 EP disclosed
EP-0530849-A2 Fine pattern forming material and pattern forming method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1993-03-10 EP disclosed
EP-0348961-A2 Fine pattern forming material and pattern forming method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1990-01-03 EP disclosed
US-4835312-A Production process of N-substituted amide compounds MITSUI CHEMICALS, INCORPORATED (JP) 1989-05-30 US disclosed
EP-0183191-B1 THIENYLTHIAZOLE COMPOUNDS Yoshitomi Pharmaceutical Industries, Ltd. (JP) 1989-05-10 EP disclosed
US-4720493-A Thienylthiazole compounds YOSHITOMI PHARMACEUTICAL INDUSTRIES, LTD. (JP) 1988-01-19 US disclosed
EP-0183191-A1 Thienylthiazole compounds Yoshitomi Pharmaceutical Industries, Ltd. (JP) 1986-06-04 EP disclosed
US-4231786-A TO CROPS BY THIOLCARBAMATES, SAFENING AGENT MONSANTO COMPANY (US) 1980-11-04 US disclosed