Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHAT | P28329 | 9/20 | 0.75 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.38 |
| ▸ | RAB9A | P51151 | 3/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | HPGD | P15428 | 2/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.37 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 3/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | ALDH1A3 | P47895 | 2/20 | 0.36 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | ALPG | P10696 | 1/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | GFER | P55789 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9455281 | 1.00 | CHAT (0.75) | CHATALDH1A1RAB9AKDM4EHPGD | |
| SCHEMBL29620205 | 1.00 | CHAT (0.75) | CHATALDH1A1RAB9AKDM4EHPGD | |
| SCHEMBL9875771 | 0.76 | CHAT (0.56) | CHATALDH1A1RAB9AKDM4EHPGD | |
| SCHEMBL9455307 | 0.76 | CHAT (0.59) | CHATKDM4EHPGDCYP2C19SMN1; SMN2 | |
| SCHEMBL9455309 | 0.76 | CHAT (0.59) | CHATKDM4EHPGDCYP2C19SMN1; SMN2 | |
| SCHEMBL300426 | 0.75 | CHAT (0.61) | CHATALDH1A1RAB9AKDM4EHPGD | |
| SCHEMBL4625849 | 0.75 | CHAT (0.61) | CHATALDH1A1RAB9AKDM4EHPGD | |
| SCHEMBL9952551 | 0.71 | HDAC8 (0.53) | CHATALDH1A1RAB9AKDM4EHPGD | |
| Sulfuric Acid SCHEMBL7788002 | 0.71 | CHAT (0.52) | CHATALDH1A1RAB9AKDM4EHPGD | |
| Sulfuric Acid SCHEMBL7787999 | 0.71 | CHAT (0.52) | CHATALDH1A1RAB9AKDM4EHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4229482-B1 | POLYVINYL ACETATE BASED PHOTOPOLYMER | SHOWA CHEM (JP) | 2024-09-11 | — | — | EP | disclosed |
| CN-116348817-B | Polyvinyl acetate based photopolymer | 昭和化工株式会社 | 2024-05-07 | — | — | CN | disclosed |
| US-11860539-B2 | Polyvinyl acetate based photopolymer | SHOWA KAKO CORPORATION (JP) | 2024-01-02 | — | — | US | disclosed |
| US-20230288803-A1 | POLYVINYL ACETATE BASED PHOTOPOLYMER | SHOWA KAKO CORPORATION (JP) | 2023-09-14 | — | — | US | disclosed |
| EP-4229482-A1 | POLYVINYL ACETATE BASED PHOTOPOLYMER | Showa Kako Corporation (JP) | 2023-08-23 | — | — | EP | disclosed |
| CN-116348817-A | Polyvinyl acetate based photopolymer | 昭和化工株式会社 | 2023-06-27 | — | — | CN | disclosed |
| WO-2022081652-A1 | POLYVINYL ACETATE BASED PHOTOPOLYMER | SHOWA KAKO CORPORATION (JP) | 2022-04-21 | — | — | WO | disclosed |
| US-5246815-A | Multilayer light sensitive element with polymer films | GEN. DIRECTOR OF THE AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY (JP) | 1993-09-21 | — | — | US | disclosed |
| US-5206113-A | Photocurable | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-04-27 | — | — | US | disclosed |
| EP-0252150-B1 | PHOTOSENSITIVE RESIN COMPOSITION FOR SCREEN PROCESS | Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) | 1992-12-30 | — | — | EP | disclosed |
| EP-0252152-B1 | PHOTOSENSITIVE EMULSION FOR COATING PLASTIC FILM | Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) | 1992-05-13 | — | — | EP | disclosed |
| EP-0415302-A2 | Graft polymers with unsaturated side chains, light sensitive compositions containing them and coating composition with these polymers | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-03-06 | — | — | EP | disclosed |
| US-4920030-A | Containing photocrosslinkable polyvinyl alcohol | GENERAL DIRECTOR OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1990-04-24 | — | — | US | disclosed |
| EP-0252152-A1 | PHOTOSENSITIVE EMULSION FOR COATING PLASTIC FILM | Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) | 1988-01-13 | — | — | EP | disclosed |
| EP-0252150-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR SCREEN PROCESS | Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) | 1988-01-13 | — | — | EP | disclosed |
| US-4339524-A | VINYL ACETATE, VINYL ALCOHOL ACETAL | AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY MINISTRY OF INTERNATIONAL TRADE AND INDUSTRY (JP) | 1982-07-13 | — | — | US | disclosed |