SCHEMBL94818

SCHEMBL94818

Cc1c(C)c(C)c(C(=O)c2c(C)c(C)c(C)c(C)c2C)c(C)c1C

nearest known ligand 0.34

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
GFER P55789 1/20 0.34
PTPN1 P18031 1/20 0.32
ALDH1A1 P00352 1/20 0.32
LMNA P02545 1/20 0.32
LDHA P00338 1/20 0.31
LDHB P07195 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP3A4 P08684 1/20 0.31
POLB P06746 1/20 0.30
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20412281 0.85 IMPDH2 (0.30) GFER
SCHEMBL16475964 0.85 LDHA (0.34) GFERLDHALDHBCYP3A4
SCHEMBL9474192 0.81
SCHEMBL13950619 0.78
SCHEMBL1236815 0.74 LDHA (0.44) ALDH1A1LDHALDHBCYP1A2CYP3A4
SCHEMBL599331 0.74 LDHA (0.44) ALDH1A1LDHALDHBCYP1A2CYP3A4
SCHEMBL11893177 0.74 CYP3A4 (0.46) ALDH1A1LMNACYP1A2CYP3A4
SCHEMBL30932977 0.74 CYP3A4 (0.46) ALDH1A1LMNACYP1A2CYP3A4
SCHEMBL2221293 0.72 POLB (0.52) ALDH1A1LMNAPOLB
SCHEMBL9608359 0.72 POLB (0.33) POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9862806-B2 Plastic article for automotive glazing SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-01-09 US disclosed
US-20160208132-A1 ACTINIC ENERGY RADIATION-CURABLE ACRYLIC SILICONE RESIN COMPOSITION AND COATED ARTICLE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-07-21 US disclosed
US-20150132544-A1 INK COMPOSITION, IMAGE FORMING METHOD, AND PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2015-05-14 US disclosed
US-8642672-B2 Coating composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-04 US disclosed
US-20130164539-A1 PLASTIC SUBSTRATE FOR AUTOMOTIVE GLAZING AND ITS REPAIRING METHOD KABUSHIKI KAISHA TOYOTA JIDOSHOKKI (JP) 2013-06-27 US disclosed
US-20120213978-A1 INK COMPOSITION, IMAGE FORMING METHOD, AND PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2012-08-23 US disclosed
US-20120059080-A1 COATING COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-08 US disclosed
US-20120058347-A1 PLASTIC ARTICLE FOR AUTOMOTIVE GLAZING SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-08 US disclosed
US-8052900-B2 Reactive UV absorber, UV-screen film-forming curable coating solution, UV-screen film, and substrate having UV-screening function SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-11-08 US disclosed